SCHEMBL9225947

SCHEMBL9225947

CC(C)(C)CC[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9880104 0.76
SCHEMBL16159004 0.73
SCHEMBL7926816 0.73 ALDH1A1 (0.30)
SCHEMBL9299517 0.73
SCHEMBL895844 0.73
SCHEMBL23794967 0.73
SCHEMBL19542914 0.73
SCHEMBL6858597 0.73 ALDH1A1 (0.53)
SCHEMBL7926814 0.73
SCHEMBL756966 0.71 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11814391-B2 Macrocyclic compounds for the treatment of medical disorders ACHILLION PHARMACEUTICALS, INC. (US) 2023-11-14 US disclosed
US-20230357199-A1 ARYL, HETEROARYL, AND HETEROCYCLIC PHARMACEUTICAL COMPOUNDS FOR TREATMENT OF MEDICAL DISORDERS ACHILLION PHARMACEUTICALS, INC. 2023-11-09 US disclosed
US-11718626-B2 Macrocyclic compounds for treatment of medical disorders ACHILLION PHARMACEUTICALS, INC. (US) 2023-08-08 US disclosed
US-11708351-B2 Aryl, heteroaryl, and heterocyclic pharmaceutical compounds for treatment of medical disorders ACHILLION PHARMACEUTICALS, INC. (US) 2023-07-25 US disclosed
US-8734904-B2 Methods of forming topographical features using segregating polymer mixtures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-27 US disclosed
US-8734904-B2 Methods of forming topographical features using segregating polymer mixtures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-27 US disclosed
US-20120135146-A1 METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES JSR CORPORATION (JP) 2012-05-31 US disclosed
US-20110313184-A1 INSULATING FILM MATERIAL, AND FILM FORMATION METHOD UTILIZING THE MATERIAL, AND INSULATING FILM TAIYO NIPPON SANSO CORPORATION (JP) 2011-12-22 US disclosed
US-20080207005-A1 Wafer Cleaning After Via-Etching FREESCALE SEMICONDUCTOR, INC. (US) 2008-08-28 US disclosed
EP-0378430-B1 Novel organosilicon compound and process for producing organosilicon compound AGENCY IND SCIENCE TECHN (JP) 1995-02-01 EP disclosed
US-5151538-A ORGANOSILICON COMPOUND AND PROCESS FOR PRODUCING ORGANOSILICON COMPOUND AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1992-09-29 US disclosed