SCHEMBL92439

SCHEMBL92439

FC(F)(F)COC(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22077362 0.92
SCHEMBL1116348 0.81 CA1 (0.32)
SCHEMBL92390 0.81
SCHEMBL15851481 0.78
SCHEMBL10021963 0.78
SCHEMBL14883740 0.78 LMNA (0.33)
SCHEMBL15905604 0.76
SCHEMBL5271852 0.75
SCHEMBL23647959 0.74
SCHEMBL20359715 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025053009-A1 METHOD FOR PRODUCING PARTICLES CONTAINING FLUORINE-CONTAINING POLYMER AGC株式会社 2025-03-13 WO disclosed
CN-118355062-A Gas barrier film and packaging material DIC株式会社 2024-07-16 CN disclosed
US-12018106-B2 Fluorosulfonyl group-containing fluoropolymer and method for producing same, sulfonic acid group-containing fluoropolymer and method for producing same, solid polymer electrolyte membrane, membrane electrode assembly, and solid polymer fuel cell AGC Inc. (JP) 2024-06-25 US disclosed
CN-114206612-B Gas barrier laminate and packaging material DIC株式会社 2024-06-25 CN disclosed
CN-114728306-B Thermosetting resin composition, cured film, method for forming multilayer coating film, ester compound, and polymer 共荣社化学株式会社 2024-06-14 CN disclosed
CN-118019808-A Curable resin composition 共荣社化学株式会社 2024-05-10 CN disclosed
US-20230374355-A1 ADHESIVE COMPOSITION, DIE ATTACH MATERIAL, SEALING AGENT OR COATING AGENT FOR PROTECTION, AND ELECTRICAL/ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-23 US disclosed
CN-114026136-B Fluorine-containing copolymer, optical resin composition, and optical resin molded body 日东电工株式会社 2023-11-03 CN disclosed
CN-113646347-B Aqueous thermosetting resin composition and cured film 共荣社化学株式会社 2023-05-23 CN disclosed
EP-4050041-A1 FLUOROSULFONYL GROUP-CONTAINING FLUOROPOLYMER AND METHOD FOR PRODUCING SAME, SULFONIC ACID GROUP-CONTAINING FLUOROPOLYMER AND METHOD FOR PRODUCING SAME, SOLID POLYMER ELECTROLYTE MEMBRANE, MEMBRANE ELECTRODE ASSEMBLY, AND SOLID POLYMER FUEL CELL AGC INC. (JP) 2022-08-31 EP disclosed
US-8129435-B2 Perfluoropolyether-modified polysiloxane, a method for preparing the same and a defoaming agent comprising the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20120016081-A1 CURABLE PERFLUOROPOLYETHER GEL COMPOSITION AND GEL PRODUCT PRODUCED BY USING CURED PERFLUOROPOLYETHER GEL COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-19 US disclosed
US-20110217250-A1 COMPOSITION FOR A COSMETIC AND A COSMETIC COMPRISING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-08 US disclosed
US-20110218284-A1 COMPOSITION COMPRISING A FLUORINE-CONTAINING ORGANOPOLYSILOXANE AND A PROCESS FOR PREPARING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-08 US disclosed
US-20100305012-A1 Lubricant Composition NOK KLUEBER CO., LTD. (JP) 2010-12-02 US disclosed
US-7842626-B2 Partially fluorinated compositions and surface active agents E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-11-30 US disclosed
US-7635789-B2 Fluoroalkyl acid amide surfactants E.I. DU PONT DE NEMOURS AND COMPANY (US) 2009-12-22 US disclosed
US-20090042997-A1 FLUOROALKYL ACID AMIDE SURFACTANTS THE CHEMOURS COMPANY FC, LLC 2009-02-12 US disclosed
US-20090043130-A1 Fluoroalkyl surfactants E. I. DU PONT DE NEMOURS AND COMPANY 2009-02-12 US disclosed
US-20080113172-A1 Partially fluorinated compositions and surface active agents E. I. DU PONT DE NEMOURS AND COMPANY 2008-05-15 US disclosed