SCHEMBL9244606

SCHEMBL9244606

[CH2]C([O])(CC=C)Oc1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42
ALDH1A1 P00352 2/20 0.42
HTT P42858 2/20 0.40
THRB P10828 1/20 0.35
KMT2A Q03164 3/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
MEN1 O00255 2/20 0.35
KDM4E B2RXH2 1/20 0.35
MAPT P10636 1/20 0.34
GAA P10253 2/20 0.33
GLA P06280 1/20 0.33
RAB9A P51151 1/20 0.33
CYP3A4 P08684 1/20 0.32
ALOX15 P16050 1/20 0.31
KCNA3 P22001 1/20 0.31
LTA4H P09960 1/20 0.31
TGM2 P21980 1/20 0.31
CYP2C19 P33261 1/20 0.31
TEAD1 P28347 1/20 0.31
TEAD3 Q99594 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10529703 1.00 TSHR (0.42) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL29226500 0.78 TSHR (0.41) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL9751149 0.74 MAPT (0.42) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL7594365 0.72 ALDH1A1 (0.41) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL1811048 0.72 MAPT (0.47) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL11115586 0.72 PPARG (0.50) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL7120119 0.70 ALDH1A1 (0.40) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL4055171 0.69 ALDH1A1 (0.39) TSHRALDH1A1HTTTHRBKMT2A
Sulfuric Acid SCHEMBL11626920 0.69 MAPT (0.42) TSHRALDH1A1HTTTHRBKMT2A
SCHEMBL10903534 0.69 ALDH1A1 (0.46) TSHRALDH1A1HTTTHRBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5462831-A Formaldehyde-hardened film material containing a polyoxyalkylene compound in protective antistress layer; phosphoric acid ester surfactant in developer; oxalic acid in fixer AGFA-GEVAERT, N.V. (BE) 1995-10-31 US disclosed