SCHEMBL9252993

SCHEMBL9252993

OC=c1ccccc1=CO

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.35
CA12 O43570 2/20 0.35
CA2 P00918 2/20 0.35
CA3 P07451 2/20 0.35
CA4 P22748 2/20 0.35
CA14 Q9ULX7 2/20 0.35
LMNA P02545 2/20 0.35
BLM P54132 2/20 0.35
KDM4E B2RXH2 1/20 0.35
NPC1 O15118 1/20 0.35
GMNN O75496 1/20 0.35
ALDH1A1 P00352 1/20 0.35
EGFR P00533 1/20 0.35
FYN P06241 1/20 0.35
POLB P06746 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAPT P10636 1/20 0.35
MMP9 P14780 1/20 0.35
HPGD P15428 1/20 0.35
ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15125814 0.78
SCHEMBL9442121 0.67
SCHEMBL23824904 0.62 CYP19A1 (0.41) LMNABLMKDM4ENPC1ALDH1A1
SCHEMBL19871625 0.61 CYP3A4 (0.35) TDP1LMNABLMALDH1A1CYP3A4
SCHEMBL10066554 0.61 TDP1 (0.33) TDP1LMNABLMALDH1A1CYP2A6
SCHEMBL8903319 0.61 TDP1 (0.33) TDP1LMNABLMALDH1A1CYP2A6
SCHEMBL819351 0.61 TSHR (0.35) TDP1CA12CA2CA4CA14
Naphthalene SCHEMBL30426987 0.59 CYP2A6 (0.57) TDP1CA2LMNABLMKDM4E
SCHEMBL26071 0.59
Naphthalene SCHEMBL20578253 0.59 CYP2A6 (0.57) TDP1CA2LMNABLMKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106317082-B A kind of Rufloxacin (rhodanine beta-unsaturated ketone) amide derivatives and its preparation method and application 河南大学 2018-08-31 CN claimed
JP-2242816-A None JP disclosed
CN-103936709-B Synthetic method of piperonal 李东风 2017-01-18 CN disclosed
US-5432237-A Radically polymerizable composition SHOWA DENKO K.K. (JP) 1995-07-11 US disclosed
EP-0399463-B1 Radically polymerizable composition SHOWA DENKO KK (JP) 1994-02-23 EP disclosed
CN-1022691-C Composition of free redical polymerization SHOWA DENKO KK (JP) 1993-11-10 CN disclosed
CN-1047515-A The composition of free redical polymerization SHOWA DENKO KK (JP) 1990-12-05 CN disclosed
EP-0399463-A2 Radically polymerizable composition SHOWA DENKO KABUSHIKI KAISHA (JP) 1990-11-28 EP disclosed
JP-H02242816-A POLYMER HAVING ISOTHIANAPHTHENE STRUCTURE AND PRODUCTION THEREOF SHOWA DENKO KK 1990-09-27 JP disclosed
US-4505800-A Sodium-selective compositions and electrodes containing same EASTMAN KODAK COMPANY (US) 1985-03-19 US disclosed