SCHEMBL9256044

SCHEMBL9256044

[CH2]CCCCC1CCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9256718 0.98 EPHX1 (0.61)
SCHEMBL1526975 0.92
SCHEMBL6386082 0.89 EPHX1 (0.47)
SCHEMBL68357 0.87 EPHX1 (0.50)
SCHEMBL2047409 0.87 EPHX1 (0.45)
SCHEMBL7290456 0.85 EPHX1 (0.48)
SCHEMBL9264950 0.85 EPHX1 (0.44)
SCHEMBL12677249 0.84 EPHX1 (0.76)
SCHEMBL9255771 0.83 EPHX1 (0.47)
SCHEMBL5263720 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023125182-A1 PROPIONIC ACID DERIVATIVE AND MEDICAL USE THEREOF 海思科医药集团股份有限公司 2023-07-06 WO claimed
WO-2023155866-A1 PYRAZOLOPYRIDINE DERIVATIVE AND APPLICATION THEREOF IN MEDICINE 四川海思科制药有限公司 2023-08-24 WO disclosed
WO-2023125182-A1 PROPIONIC ACID DERIVATIVE AND MEDICAL USE THEREOF 海思科医药集团股份有限公司 2023-07-06 WO disclosed
US-10591816-B2 Photosensitive resin composition, color filter, and liquid crystal display element thereof CHI MEI CORPORATION (TW) 2020-03-17 US disclosed
CN-110320755-A Minus white photosensitive resin composition and its application 奇美实业股份有限公司 2019-10-11 CN disclosed
CN-105093832-B Photosensitive composition, protective film and element having protective film 奇美实业股份有限公司 2019-08-30 CN disclosed
CN-104423170-B Photosensitive polysiloxane composition, protective film and assembly with protective film 奇美实业股份有限公司 2019-05-24 CN disclosed
CN-104345567-B photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2019-04-02 CN disclosed
CN-109116681-A Chemically amplified positive photosensitive resin composition, photoresist pattern and method for forming the same, and electronic device 奇美实业股份有限公司 2019-01-01 CN disclosed
US-10162260-B2 Photosensitive resin composition, protective film, and liquid crystal display element CHI MEI CORPORATION (TW) 2018-12-25 US disclosed
US-20140178822-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2014-06-26 US disclosed
US-20140178819-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2014-06-26 US disclosed
US-20130310497-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2013-11-21 US disclosed
CN-103376661-A Photocurable polysiloxane composition, protective film and element having protective film CHI MEI COR 2013-10-30 CN disclosed
US-20130280541-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2013-10-24 US disclosed
US-20130260108-A1 PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2013-10-03 US disclosed
US-5455355-A Postemergence, preemergence herbicides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-10-03 US disclosed
US-5298632-A Herbicidal pyrimidine compounds, compositions containing the same and method of use SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-03-29 US disclosed
US-5232897-A Herbicidal pyrimidine compounds, compositions containing the same and method of use SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-08-03 US disclosed
EP-0457505-A2 Pyrimidine derivatives and their use as herbicides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-11-21 EP disclosed