Iodide

Iodide

SCHEMBL926315

CCCCCCCCCCCCN1C=CN(C)C1.I

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GUSB P08236 2/20 0.37
▸ EBP Q15125 1/20 0.37
▸ SIGMAR1 Q99720 1/20 0.37
▸ NPC1 O15118 2/20 0.36
▸ LMNA P02545 2/20 0.36
▸ APOBEC3A P31941 2/20 0.36
▸ HTT P42858 2/20 0.36
▸ RAB9A P51151 2/20 0.36
▸ APOBEC3G Q9HC16 2/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ NOD2 Q9HC29 1/20 0.36
▸ PTGS1 P23219 3/20 0.35
▸ PTGS2 P35354 3/20 0.35
▸ MGLL Q99685 2/20 0.35
▸ FAAH O00519 1/20 0.35
▸ ALDH1A1 P00352 2/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2D6 P10635 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ DNM1 Q05193 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL5085010 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL1735058 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL1758284 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL594562 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL2125638 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL5091920 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL5088508 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL5087102 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
Iodide SCHEMBL5087913 1.00 GUSB (0.37) GUSBEBPSIGMAR1NPC1LMNA
SCHEMBL413429 0.98 GUSB (0.38) GUSBEBPSIGMAR1NPC1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119823109-A An electrochromic material electrochromic composition and electrochromic device 吉林大学 2025-04-15 — — CN claimed
CN-111117594-B Electrochromic material and electrochromic device based on dynamic metal-ligand complexation 吉林大学 2024-03-26 — — CN claimed
CN-115010836-B Electrochromic polymer, nano particle and device 吉林大学 2023-09-08 — — CN claimed
EP-3753973-B1 A METHOD FOR SEALING A GAP BETWEEN ADJOINING OR CONNECTED SOLID SURFACES ON AN AIRCRAFT BOEING CO (US) 2022-09-28 — — EP claimed
CN-115010836-A Electrochromatic polymer, nano particles and device 吉林大学 2022-09-06 — — CN claimed
CN-109280186-B Method and composition for curing the surface of uncured polysulfide rubber 波音公司 2022-05-10 — — CN claimed
CN-110386988-B Modified starch and preparation method and application thereof 瑞辰星生物技术(广州)有限公司 2021-06-04 — — CN claimed
CN-109504015-B Electrochromic polymer material based on combination strategy and preparation of electrochromic device 常州铱视光电科技有限公司 2021-05-11 — — CN claimed
CN-108795407-B Electrochromic material based on action of electrochromic acid and preparation of electrochromic device 常州铱视光电科技有限公司 2021-04-16 — — CN claimed
CN-112390260-A Method for producing mesoporous porous silica from biomass 韩国窑业技术园 2021-02-23 — — CN claimed
US-20180337004-A1 LEAD-FREE PEROVSKITE-BASED HOLE TRANSPORT MATERIAL COMPOSITES, SOLAR CELLS INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SAME UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TEC HNOLOGY) (KR) 2018-11-22 — — US claimed
CN-108795407-A Based on the electroluminescent sour electrochromic material acted on and prepare electrochromic device 常州铱视光电科技有限公司 2018-11-13 — — CN claimed
CN-104143494-B There is the plasma processing chamber component that protective layer is formed in situ in plasma exposure face 朗姆研究公司 2018-08-14 — — CN claimed
US-9394388-B2 Hybrid supported metallocene catalyst, method for preparing the same, and process for preparing polyolefin using the same SK INNOVATION CO., LTD. (KR) 2016-07-19 — — US claimed
CN-104159929-A Supported composite metallocene catalyst, method for preparing the same, and method for preparing polyolefin using the same SK INNOVATION CO LTD 2014-11-19 — — CN claimed
CN-104143494-A Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RES CORP 2014-11-12 — — CN claimed
WO-2013133595-A1 HYBRID SUPPORTED METALLOCENE CATALYST, METHOD FOR PREPARING THE SAME, AND PROCESS FOR PREPARING POLYOLEFIN USING THE SAME SK INNOVATION CO., LTD. (KR) 2013-09-12 — — WO claimed
US-8399375-B2 Supported metallocene catalyst composition and a process for the preparation of polyolefin using the same SK GLOBAL CHEMICAL CO., LTD. (KR) 2013-03-19 — — US claimed
US-20110105705-A1 Metallocene Supported Catalyst Composition and a Process for the Preparation of Polyolefin Using the Same SK ENERGY CO., LTD. (KR) 2011-05-05 — — US claimed
EP-2258731-A2 METALLOCENE SUPPORTED CATALYST COMPOSITION AND A PROCESS FOR THE PREPARATION OF POLYOLEFIN USING THE SAME SK Energy Co., Ltd. (KR) 2010-12-08 — — EP claimed
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