SCHEMBL927675

SCHEMBL927675

O=C(O)Cc1ccc(O)cc1CCO

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CAMK2A Q9UQM7 6/20 0.50
EGFR P00533 2/20 0.47
ALDH1A1 P00352 1/20 0.47
LMNA P02545 1/20 0.47
GLA P06280 1/20 0.47
CYP2C9 P11712 1/20 0.47
HPGD P15428 1/20 0.47
TSHR P16473 1/20 0.47
NFKB1 P19838 1/20 0.47
PMP22 Q01453 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
CA2 P00918 1/20 0.45
AKR1B1 P15121 2/20 0.45
LCK P06239 2/20 0.45
FYN P06241 1/20 0.45
GRB2 P62993 1/20 0.45
MEN1 O00255 1/20 0.43
POLB P06746 1/20 0.43
KMT2A Q03164 1/20 0.43
HTR2C P28335 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27903131 0.83 TYR (0.52) ALDH1A1TSHRCA2MEN1KMT2A
SCHEMBL11486533 0.81 CAMK2A (0.50) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL27925319 0.80 TYR (0.61) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL156238 0.79 TYR (0.60) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL29419312 0.79 TYR (0.60) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL3124446 0.78 AKR1B1 (0.59) AKR1B1
SCHEMBL29354171 0.78 EGFR (0.70) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL2535192 0.78 EGFR (0.70) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL30452045 0.78 EGFR (0.70) CAMK2AEGFRALDH1A1LMNAGLA
SCHEMBL155333 0.78 EGFR (0.70) CAMK2AEGFRALDH1A1LMNAGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118019780-A Polyimide, polyimide precursor, composition, and method for producing polyimide 富士胶片株式会社 2024-05-10 CN disclosed
WO-2023054221-A1 POLYIMIDE, POLYIMIDE PRECURSOR, COMPOSITION, AND PRODUCTION METHOD FOR POLYIMIDE 富士フイルム株式会社 2023-04-06 WO disclosed
WO-2023054222-A1 COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, STRUCTURE, AND DEVICE 富士フイルム株式会社 2023-04-06 WO disclosed
US-10868329-B2 All solid state secondary battery, solid electrolyte composition used therefor, electrode sheet for battery using the same, and method for manufacturing electrode sheet for battery and all solid state secondary battery FUJIFILM CORPORATION (JP) 2020-12-15 US disclosed
EP-3493317-A1 SOLID ELECTROLYTE COMPOSITION, SOLID-ELECTROLYTE-CONTAINING SHEET AND ALL-SOLID-STATE SECONDARY BATTERY, PRODUCTION METHOD FOR SOLID-ELECTROLYTE-CONTAINING SHEET AND ALL-SOLID-STATE SECONDARY BATTERY, SEGMENTED POLYMER, AND NON-AQUEOUS-SOLVENT DISPERSION OF POLYMER AND SEGMENTED POLYMER Fujifilm Corporation (JP) 2019-06-05 EP disclosed
US-20190157710-A1 SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE-CONTAINING SHEET, ALL-SOLID STATE SECONDARY BATTERY, METHODS FOR MANUFACTURING SOLID ELECTROLYTE-CONTAINING SHEET AND ALL-SOLID STATE SECONDARY BATTERY, SEGMENTED POLYMER, AND NON-AQUEOUS SOLVENT DISPERSION OF POLYMER AND SEGMENTED POLYMER FUJIFILM CORPORATION (JP) 2019-05-23 US disclosed
US-20170301949-A1 ALL SOLID STATE SECONDARY BATTERY, SOLID ELECTROLYTE COMPOSITION USED THEREFOR, ELECTRODE SHEET FOR BATTERY USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRODE SHEET FOR BATTERY AND ALL SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2017-10-19 US disclosed
US-20170288144-A1 ALL SOLID STATE SECONDARY BATTERY, SOLID ELECTROLYTE COMPOSITION USED THEREFOR, ELECTRODE SHEET FOR BATTERY, AND METHOD FOR MANUFACTURING ELECTRODE SHEET FOR BATTERY AND ALL SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2017-10-05 US disclosed
CN-103703417-B Photosensitive composite, original edition of lithographic printing plate, the manufacture method of polyurethane and polyurethane 富士胶片株式会社 2017-07-14 CN disclosed
EP-2259141-B1 PROCESS FOR PRODUCING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORP (JP) 2016-11-23 EP disclosed
US-6844137-B2 Capable of forming a planographic plate having excellent plate life; capable of directly being engraved from digital data of a computer or like by recording with solid state laser and a semiconductor laser irradiating infrared rays FUJI PHOTO FILM CO., LTD. (JP) 2005-01-18 US disclosed
US-6727044-B1 LASER SCANNING LITHOGRAPHIC PRINTING ORIGINAL PLATE WHICH CAN PROVIDE A PRINTING PLATE HAVING A SUFFICIENTLY LONG PRESS LIFE EVEN BY HIGH-SPEED SCAN EXPOSURE AND CAUSES LITTLE FLUCTUATION IN THE PRINTING PERFORMANCE OF THE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20020086238-A1 Capable of forming a planographic plate having excellent plate life; capable of directly being engraved from digital data of a computer or like by recording with solid state laser and a semiconductor laser irradiating infrared rays FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
EP-1136255-A2 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2001-09-26 EP disclosed
EP-0949540-A1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-13 EP disclosed
US-5316885-A THERMAL TRANSFER PRINTING KAO CORPORATION (JP) 1994-05-31 US disclosed
US-5294490-A Having a shell of endcapped polyiso(thio)urethanes having dissociable linkages KAO CORPORATION (JP) 1994-03-15 US disclosed
EP-0472106-B1 Pulverulent ink and printing methods KAO CORP (JP) 1994-02-16 EP disclosed
EP-0514843-A1 Encapsulated toner for heat and-pressure fixing Kao Corporation (JP) 1992-11-25 EP disclosed
EP-0472106-A2 Pulverulent ink and printing methods KAO CORPORATION (JP) 1992-02-26 EP disclosed