Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92813 | 0.79 | LMNA (0.34) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL10082814 | 0.77 | MEN1 (0.42) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL92787 | 0.74 | MEN1 (0.40) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL12251777 | 0.74 | LMNA (0.46) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL19759288 | 0.72 | LMNA (0.43) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL22776 | 0.72 | MEN1 (0.45) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL17882175 | 0.72 | LMNA (0.43) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL28692310 | 0.71 | MEN1 (0.41) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL1191595 | 0.71 | LMNA (0.41) | LMNAMEN1CYP3A4ALOX15KMT2A | |
| SCHEMBL26501077 | 0.71 | LMNA (0.41) | LMNAMEN1CYP3A4ALOX15KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8101341-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-20100178617-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |