SCHEMBL9285641

SCHEMBL9285641

CCO/C(O)=C/C(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isopropyl Alcohol SCHEMBL29555193 0.89 ALDH1A1 (0.39)
SCHEMBL14200168 0.82
SCHEMBL14008633 0.80 NPSR1 (0.58)
SCHEMBL10455610 0.77 ALDH1A1 (0.50)
SCHEMBL6127444 0.77
SCHEMBL11818474 0.77
SCHEMBL17300447 0.77
SCHEMBL4844923 0.76 NPSR1 (0.48)
SCHEMBL4844916 0.76 NPSR1 (0.48)
SCHEMBL17619384 0.76 NPSR1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-9810821-B2 Infrared ray cutoff filter FUJIFILM CORPORATION (JP) 2017-11-07 US disclosed
US-9810821-B2 Infrared ray cutoff filter FUJIFILM CORPORATION (JP) 2017-11-07 US disclosed
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
US-20150346404-A1 INFRARED RAY ABSORBING COMPOSITION OR INFRARED RAY ABSORBING COMPOSITION KIT, INFRARED RAY CUT FILTER USING THE SAME, METHOD FOR PRODUCING THE INFRARED RAY CUT FILTER, CAMERA MODULE, AND METHOD FOR PRODUCING THE CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-12-03 US disclosed
US-20150293281-A1 CURABLE RESIN COMPOSITION FOR FORMING INFRARED REFLECTIVE FILM, INFRARED REFLECTIVE FILM AND MANUFACTURING METHOD THEREOF, INFRARED RAY CUT-OFF FILTER, AND SOLID-STATE IMAGING DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
US-20150277002-A1 CURABLE RESIN COMPOSITION, INFRARED RAY CUTOFF FILTER AND SOLID-STATE IMAGING DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2015-10-01 US disclosed
US-20150252005-A1 Method of Synthesizing Organic Molecules VTU HOLDING GMBH (AT) 2015-09-10 US disclosed
US-20150138369-A1 NEAR INFRARED ABSORPTIVE LIQUID COMPOSITION, NEAR INFRARED CUT FILTER USING THE SAME, METHOD OF MANUFACTURING THE SAME, AND CAMERA MODULE AND METHOD OF MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2015-05-21 US disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-8835649-B2 Method of synthesizing organic molecules using ionic liquids comprising a carbanion VTU HOLDING GMBH (AT) 2014-09-16 US disclosed
US-20120136161-A1 Method of Synthesizing Organic Molecules VTU HOLDING GMBH (AT) 2012-05-31 US disclosed