SCHEMBL9305217

SCHEMBL9305217

C=CCOc1ccc(C(C)=O)cc1OC

nearest known ligand 0.74

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.74
POLB P06746 1/20 0.57
KMT2A Q03164 4/20 0.57
PDE4B Q07343 1/20 0.54
TSHR P16473 2/20 0.51
MAOB P27338 2/20 0.50
MAPK1 P28482 1/20 0.50
MEN1 O00255 3/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
ALDH1A1 P00352 3/20 0.49
CYP1A2 P05177 1/20 0.49
CYP3A4 P08684 1/20 0.49
CYP2C9 P11712 1/20 0.49
CYP2C19 P33261 1/20 0.49
GAA P10253 1/20 0.48
CYP2D6 P10635 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29537569 1.00 KDM4E (0.74) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL8484361 0.94 KDM4E (0.66) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL22229873 0.92 KDM4E (0.62) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL31737057 0.88 KDM4E (0.74) KDM4EPDE4BTSHRMAPK1SMN1; SMN2
SCHEMBL14907128 0.88 KDM4E (0.74) KDM4EPDE4BTSHRMAPK1SMN1; SMN2
SCHEMBL3547607 0.87 KDM4E (0.72) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL1067955 0.87 KDM4E (0.72) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL31737297 0.85 KDM4E (0.71) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL680755 0.85 KDM4E (0.71) KDM4EPOLBKMT2APDE4BTSHR
SCHEMBL28326914 0.85 KDM4E (1.00) KDM4EPOLBKMT2APDE4BTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11953833-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method NIKON CORPORATION (JP) 2024-04-09 US disclosed
US-11225461-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method NIKON CORPORATION (JP) 2022-01-18 US disclosed
US-11225461-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method NIKON CORPORATION (JP) 2022-01-18 US disclosed
US-20200233304-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD NIKON CORPORATION (JP) 2020-07-23 US disclosed
US-20190352260-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD NIKON CORPORATION (JP) 2019-11-21 US disclosed
US-20190352260-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD NIKON CORPORATION (JP) 2019-11-21 US disclosed
US-5372949-A Medical diagnosis ABBOTT LABORATORIES (US) 1994-12-13 US disclosed
US-5371296-A Light stability, sunburn prevention KAO CORPORATION (JP) 1994-12-06 US disclosed
US-5191121-A Sunscreen KAO CORPORATION (JP) 1993-03-02 US disclosed
EP-0504844-A2 4,4-Dimethyl-1-phenylpentane-1,3-dione derivative and UV ray absorbent and cosmetic containing the same KAO CORPORATION (JP) 1992-09-23 EP disclosed
US-5145791-A Immunology ABBOTT LABORATORIES (US) 1992-09-08 US disclosed
EP-0252405-A2 3-methoxy-4-hydroxyphenylglycol fluorescence polarization immunoassay ABBOTT LABORATORIES (US) 1988-01-13 EP disclosed
US-4707481-A Pyridazinones, their preparation and use, and bronchospasmolytic medicaments containing pyridazinones BYK GULDEN LOMBERG CHEMISCHE FABRIK GMBH (DE) 1987-11-17 US disclosed
EP-0125636-B1 PYRIDAZINONES, THEIR PREPARATION AND USE, MEDICINES CONTAINING THESE PYRIDAZINONES Byk Gulden Lomberg Chemische Fabrik GmbH (DE) 1987-04-01 EP disclosed
WO-1984004521-A1 PYRIDAZINONES, THEIR PREPARATION AND USE, AND MEDICAMENTS CONTAINING PYRIDAZINONES BYK GULDEN LOMBERG CHEM FAB (DE) 1984-11-22 WO disclosed
EP-0125636-A1 Pyridazinones, their preparation and use, medicines containing these pyridazinones Byk Gulden Lomberg Chemische Fabrik GmbH (DE) 1984-11-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11953833-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method CYP1A1, CYP1A2, CYP1B1 KDM4E 4675/4885POLB 1448/4885KMT2A 3481/4885
US-20200233304-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD CYP1A1, CYP1A2, CYP1B1 KDM4E 4675/4885POLB 1448/4885KMT2A 3481/4885
US-11225461-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method CYP3A4, CYP4F11, COASY KDM4E 4699/4885POLB 1659/4885KMT2A 3102/4885
US-20190352260-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD CYP3A4, CYP4F11, COASY KDM4E 4699/4885POLB 1659/4885KMT2A 3102/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.