SCHEMBL22229873

SCHEMBL22229873

C=CCOc1ccc(C(C)=O)cc1OCC=C

nearest known ligand 0.62

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.62
PDE4B Q07343 1/20 0.51
POLB P06746 1/20 0.48
GAA P10253 1/20 0.48
TSHR P16473 1/20 0.48
CREBBP Q92793 2/20 0.47
KMT2A Q03164 4/20 0.47
LMNA P02545 1/20 0.43
ALDH1A1 P00352 3/20 0.43
HIF1A Q16665 1/20 0.43
MEN1 O00255 2/20 0.42
LIG1 P18858 1/20 0.42
MAPT P10636 1/20 0.42
CYP2D6 P10635 1/20 0.41
MAOB P27338 1/20 0.41
HTT P42858 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8484361 0.92 KDM4E (0.66) KDM4EPDE4BPOLBGAATSHR
SCHEMBL9305217 0.92 KDM4E (0.74) KDM4EPDE4BPOLBGAATSHR
SCHEMBL29537569 0.92 KDM4E (0.74) KDM4EPDE4BPOLBGAATSHR
SCHEMBL18374475 0.86 KDM4E (0.51) KDM4EPDE4BPOLBGAATSHR
SCHEMBL15312851 0.85 KDM4E (0.60) KDM4EPDE4BPOLBGAATSHR
SCHEMBL27908918 0.84 KDM4E (0.50) KDM4EPDE4BPOLBGAATSHR
SCHEMBL9525514 0.84 KDM4E (0.50) KDM4EGAATSHRKMT2AALDH1A1
SCHEMBL3319699 0.84 GAA (0.65) KDM4EGAATSHRCREBBPLIG1
SCHEMBL9130664 0.83 KDM4E (0.58) KDM4EPDE4BPOLBGAATSHR
SCHEMBL13690626 0.82 KDM4E (0.57) KDM4EPDE4BPOLBGAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11953833-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method NIKON CORPORATION (JP) 2024-04-09 US disclosed
CN-111183143-B Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and method for manufacturing transistor 株式会社 尼康 2023-04-04 CN disclosed
US-20200233304-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD NIKON CORPORATION (JP) 2020-07-23 US disclosed
US-20200233304-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD NIKON CORPORATION (JP) 2020-07-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11953833-B2 Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method CYP1A1, CYP1A2, CYP1B1 KDM4E 4675/4885PDE4B 3422/4885POLB 1448/4885
US-20200233304-A1 COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD CYP1A1, CYP1A2, CYP1B1 KDM4E 4675/4885PDE4B 3422/4885POLB 1448/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.