SCHEMBL9306693

SCHEMBL9306693

C=Cc1ccc(O)c(-c2cccc3ccccc23)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
MCL1 Q07820 1/20 0.43
ACMSD Q8TDX5 1/20 0.43
CYP1A2 P05177 2/20 0.41
MAOA P21397 1/20 0.41
MAOB P27338 1/20 0.41
TRPA1 O75762 1/20 0.40
BACE1 P56817 1/20 0.40
CNR2 P34972 1/20 0.40
PTPN22 Q9Y2R2 1/20 0.39
ERN1 O75460 1/20 0.38
LCK P06239 1/20 0.37
POLB P06746 1/20 0.37
PELI1 Q96FA3 1/20 0.36
USP2 O75604 1/20 0.36
PAK1 Q13153 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12023192 0.83 TRPA1 (0.47) MEN1KMT2ATRPA1CNR2LCK
SCHEMBL4040346 0.81 MEN1 (0.45) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL5669400 0.80 ANPEP (0.42) MEN1KMT2AMAOAMAOBBACE1
SCHEMBL26153496 0.78 CYP1A2 (0.58) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL93762 0.78 ESR2 (0.50) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL11782188 0.76 MCL1 (0.64) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL14680283 0.75 CYP1A2 (0.54) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL14423570 0.75 TDP1 (0.51) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL29690328 0.75 TDP1 (0.51) MEN1KMT2AMCL1ACMSDCYP1A2
SCHEMBL8124885 0.75 POLB (0.48) MEN1KMT2AMCL1ACMSDCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5376498-A Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-12-27 US disclosed
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP disclosed