SCHEMBL9306699

SCHEMBL9306699

Oc1ccc(C=Cc2ccc3ccccc3c2)cc1

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 2/20 0.75
RELA Q04206 2/20 0.73
DHODH Q02127 1/20 0.61
ALDH1A1 P00352 4/20 0.59
MAPT P10636 4/20 0.59
SMN1; SMN2 Q16637 4/20 0.59
GLA P06280 1/20 0.59
CYP1A2 P05177 3/20 0.58
KDM4E B2RXH2 3/20 0.56
MEN1 O00255 3/20 0.56
LMNA P02545 3/20 0.56
KMT2A Q03164 3/20 0.56
NPC1 O15118 2/20 0.56
RAB9A P51151 2/20 0.56
L3MBTL1 Q9Y468 1/20 0.56
NQO2 P16083 3/20 0.55
ESR1 P03372 2/20 0.55
LCK P06239 1/20 0.55
ESR2 Q92731 1/20 0.55
APP P05067 3/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5050695 0.87 RELA (0.86) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL5552162 0.87 RELA (0.86) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL5050698 0.87 RELA (0.86) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL29842519 0.87 RELA (0.86) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL5552166 0.87 RELA (0.86) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL6036974 0.86 PTGS1 (1.00) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL6036975 0.86 PTGS1 (1.00) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL5407848 0.85 RELA (1.00) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL5407847 0.85 RELA (1.00) PTGS1RELAALDH1A1MAPTSMN1; SMN2
SCHEMBL30507765 0.85 RELA (1.00) PTGS1RELAALDH1A1MAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5376498-A Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-12-27 US disclosed
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP disclosed