Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 4/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.58 |
| ▸ | TSHR | P16473 | 2/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.58 |
| ▸ | SKP2 | Q13309 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | ESR1 | P03372 | 1/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.42 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.42 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.42 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | CDC25B | P30305 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 4,4'-Methylenedianiline SCHEMBL10832019 | 1.00 | CYP3A4 (0.58) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| SCHEMBL3482071 | 0.94 | SKP2 (0.59) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| SCHEMBL31079561 | 0.91 | SKP2 (0.61) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| SCHEMBL237201 | 0.91 | SKP2 (0.61) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| SCHEMBL23272063 | 0.89 | CYP19A1 (0.53) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| Hydrochloric Acid SCHEMBL8644397 | 0.89 | SKP2 (0.59) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| Ammonia Solution, Strong SCHEMBL22344976 | 0.89 | SKP2 (0.59) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| Hydrochloric Acid SCHEMBL2929105 | 0.89 | SKP2 (0.59) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| SCHEMBL8086634 | 0.88 | SKP2 (0.58) | CYP3A4ALDH1A1TSHRTDP1SKP2 | |
| SCHEMBL27496376 | 0.86 | SKP2 (0.56) | CYP3A4ALDH1A1TSHRTDP1SKP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5306828-A | Catalytic imidation of malic anhydride with amine in solvent mixture | BROMINE COMPOUNDS LTD. (IL) | 1994-04-26 | — | — | US | claimed |
| EP-0499959-A1 | Process for the manufacture of substituted maleimides | Bromine Compounds Ltd. (IL) | 1992-08-26 | — | — | EP | claimed |
| EP-0378105-A2 | High-temperature-resistant polysulfone-polyimide block copolycondensates, their preparation method by melt-condensation, and their use | BASF Aktiengesellschaft (DE) | 1990-07-18 | — | — | EP | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4553100-A1 | POLYMER, POSITIVE AND NEGATIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| EP-0499959-A1 | Process for the manufacture of substituted maleimides | Bromine Compounds Ltd. (IL) | 1992-08-26 | — | — | EP | disclosed |
| US-4879408-A | Cycloaliphatic diisocyanates optionally in the form of isomer mixtures and a process for their production | BAYER AKTIENGESELLSCHAFT (DE) | 1989-11-07 | — | — | US | disclosed |
| US-4698424-A | POLYURETHANE LACQUERS | BAYER AKTIENGESELLSCHAFT (DE) | 1987-10-06 | — | — | US | disclosed |
| EP-0105146-B1 | PROCESS FOR PREPARATION OF DIAMINES OR MIXTURES OF DIAMINES | BAYER AG (DE) | 1985-12-18 | — | — | EP | disclosed |
| EP-0104551-B1 | CYCLOALIPHATIC DIISOCYANATES, POSSIBLY IN THE FORM OF A MIXTURE OF ISOMERS, METHOD FOR THEIR PREPARATION AND THEIR USE AS STARTING PRODUCTS IN THE PREPARATION OF SYNTHETIC PRODUCTS OF THE POLYURETHANE TYPE | BAYER AG (DE) | 1985-11-13 | — | — | EP | disclosed |
| EP-0113043-B1 | DIISOCYANATES OR MIXTURES OF DIISOCYANATES, METHOD FOR THEIR PREPARATION AND THEIR USE IN THE PREPRATION OF SYNTHETIC MATERIALS OF THE POLYURETHANE TYPE | BAYER AG (DE) | 1985-09-11 | — | — | EP | disclosed |
| EP-0113043-A1 | Diisocyanates or mixtures of diisocyanates, method for their preparation and their use in the prepration of synthetic materials of the polyurethane type | BAYER AG (DE) | 1984-07-11 | — | — | EP | disclosed |
| EP-0105146-A1 | Process for preparation of diamines or mixtures of diamines | BAYER AG (DE) | 1984-04-11 | — | — | EP | disclosed |
| EP-0104551-A1 | Cycloaliphatic diisocyanates, possibly in the form of a mixture of isomers, method for their preparation and their use as starting products in the preparation of synthetic products of the polyurethane type | BAYER AG (DE) | 1984-04-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | CYP3A4 2409/4885ALDH1A1 3706/4885TSHR 3214/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.