SCHEMBL931482

SCHEMBL931482

CN(C)c1ccc2nc3ccc(Cl)cc3[n+](-c3ccccc3)c2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.53
RAB9A P51151 3/20 0.53
L3MBTL1 Q9Y468 3/20 0.53
NLRP3 Q96P20 2/20 0.53
KDM1A O60341 2/20 0.47
APP P05067 2/20 0.40
TERT O14746 1/20 0.40
PSMB5 P28074 2/20 0.39
SLC2A1 P11166 1/20 0.38
CSF1R P07333 1/20 0.37
CHKA P35790 1/20 0.37
INSR P06213 1/20 0.37
EGFR P00533 1/20 0.37
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
USP2 O75604 1/20 0.36
POLB P06746 1/20 0.36
BLM P54132 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2977813 1.00 NPC1 (0.53) NPC1RAB9AL3MBTL1NLRP3KDM1A
Hydrochloric Acid SCHEMBL11156397 0.91 NPC1 (0.60) NPC1RAB9AL3MBTL1NLRP3KDM1A
SCHEMBL12107916 0.91 NPC1 (0.60) NPC1RAB9AL3MBTL1NLRP3KDM1A
Hydrochloric Acid SCHEMBL519644 0.87 NPC1 (0.56) NPC1RAB9AL3MBTL1NLRP3KDM1A
SCHEMBL9279444 0.87 NPC1 (0.56) NPC1RAB9AL3MBTL1NLRP3KDM1A
SCHEMBL12908917 0.87 NPC1 (0.43) NPC1RAB9AL3MBTL1NLRP3KDM1A
SCHEMBL12908929 0.86 NPC1 (0.55) NPC1RAB9AL3MBTL1NLRP3KDM1A
Hydrochloric Acid SCHEMBL2974542 0.85 NPC1 (0.73) NPC1RAB9AL3MBTL1NLRP3KDM1A
SCHEMBL2983242 0.84 NPC1 (0.49) NPC1RAB9AL3MBTL1NLRP3KDM1A
Hydrochloric Acid SCHEMBL2985575 0.84 NPC1 (0.49) NPC1RAB9AL3MBTL1NLRP3KDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7872130-B2 Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit ATOTECH DEUTSCHLAND GMBH (DE) 2011-01-18 US claimed
EP-1592825-B1 MIXTURE OF OLIGOMERIC PHENAZINIUM COMPOUNDS AND ACID BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT ATOTECH DEUTSCHLAND GMBH (DE) 2009-03-25 EP claimed
US-7872130-B2 Mixture of oligomeric phenazinium compounds and acid bath for electrolytically depositing a copper deposit ATOTECH DEUTSCHLAND GMBH (DE) 2011-01-18 US disclosed
EP-1592825-B1 MIXTURE OF OLIGOMERIC PHENAZINIUM COMPOUNDS AND ACID BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT ATOTECH DEUTSCHLAND GMBH (DE) 2009-03-25 EP disclosed