SCHEMBL9344883

SCHEMBL9344883

C=C(C)COC(C)[N+](C)(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17707258 0.83
SCHEMBL1044531 0.81
SCHEMBL947653 0.80
Hydrochloric Acid SCHEMBL3120285 0.79
Bromide SCHEMBL4910660 0.78
Hydrochloric Acid SCHEMBL271096 0.78
Iodide SCHEMBL9817902 0.78
Hydrochloric Acid SCHEMBL6809861 0.74
Hydrochloric Acid SCHEMBL3953720 0.73
Betaine SCHEMBL6140458 0.73 TSHR (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0284081-B1 Silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 1994-08-10 EP claimed
US-4946771-A POLYMERIC COUPLERS; SHARPNESS, PREVENT MIXING OF COLORS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-07 US claimed
US-4891306-A FLUOROPOLYMER FUJI PHOTO FILM CO., LTD. (JP) 1990-01-02 US claimed
EP-0284081-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1988-09-28 EP claimed
US-4891306-A FLUOROPOLYMER FUJI PHOTO FILM CO., LTD. (JP) 1990-01-02 US disclosed
US-4622288-A Photographic light-sensitive material having improved antistaticity FUJI PHOTO FILM CO., LTD. (JP) 1986-11-11 US disclosed