SCHEMBL9348786

SCHEMBL9348786

C=CC(=O)N(CC)CC(CC)CCCC

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
CA2 P00918 5/20 0.41
ZDHHC20 Q5W0Z9 2/20 0.41
ZDHHC2 Q9UIJ5 1/20 0.41
ALDH1A1 P00352 5/20 0.40
CYP3A4 P08684 5/20 0.39
TDP1 Q9NUW8 2/20 0.38
ATM Q13315 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.35
MAPK1 P28482 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
CA1 P00915 2/20 0.33
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
RECQL P46063 1/20 0.33
CA12 O43570 1/20 0.33
CA9 Q16790 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6396475 0.93 TSHR (0.53) TSHRCA2ZDHHC20ZDHHC2ALDH1A1
SCHEMBL3954169 0.85 TSHR (0.54) TSHRCA2ZDHHC20ZDHHC2ALDH1A1
SCHEMBL13862580 0.83 TSHR (0.53) TSHRCA2ZDHHC20ZDHHC2ALDH1A1
SCHEMBL8862366 0.80 CA2 (0.46) TSHRCA2ALDH1A1CYP3A4TDP1
SCHEMBL18531388 0.80 CA2 (0.46) TSHRCA2ALDH1A1CYP3A4TDP1
SCHEMBL20125903 0.79 TSHR (0.59) TSHRCA2ZDHHC20ZDHHC2ALDH1A1
SCHEMBL7789126 0.78 CA2 (0.47) TSHRCA2ALDH1A1CYP3A4TDP1
SCHEMBL15238199 0.77 CA2 (0.50) TSHRCA2ALDH1A1CYP3A4TDP1
SCHEMBL20125966 0.77 CYP3A4 (0.59) TSHRCA2ZDHHC20ZDHHC2ALDH1A1
SCHEMBL17363802 0.75 CA2 (0.48) TSHRCA2ALDH1A1CYP3A4TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0386514-B1 Transparent polymer blend and its use in moulding compositions, articles, films, coatings, adhesives and in light-sensitive registration material BASF AG (DE) 1994-10-05 EP disclosed
EP-0316618-B1 Multilayer flat light sensitive registration material BASF AG (DE) 1994-08-17 EP disclosed
US-5262486-A Modified emulsion polymers, in particular for photopolymerizable recording materials which can be developed in water and aqueous solvents BASF AKTIENGESELLSCHAFT (DE) 1993-11-16 US disclosed
US-5147757-A OPTICALLY TRANSPARENT POLYMER ALLOY AND ITS USE IN MOLDING MATERIALS, MOLDINGS, FILMS, COATINGS, ADHESIVES AND PHOTOSENSITIVE RECORDING ELEMENTS BASF AKTIENGESELLSCHAFT (DE) 1992-09-15 US disclosed
EP-0231002-B1 CROSSLINKABLE SOLID RUBBERY POLYMERS BASF Aktiengesellschaft (DE) 1992-08-12 EP disclosed
US-5102773-A For production of printing plates BASF AKTIENGESELLSCHAFT (DE) 1992-04-07 US disclosed
EP-0468289-A2 Profiled emulsion polymers, especially for water and aqueous solution developable, photopolymerizable recording material BASF Aktiengesellschaft (DE) 1992-01-29 EP disclosed
US-5055377-A LIGHT-SENSITIVE RECORDING ELEMENT AND PROCESS OF FORMING A RELIEF IMAGE WHEREIN THE RECORDING ELEMENT CONTAINS LECITHIN AS AN ADDITIVE BASF AKTIENGESELLSCHAFT (DE) 1991-10-08 US disclosed
US-5035981-A Having a top layer of high-strength, transparent, soluble or swellable polymer containing an antistatic agent of an ethoxylated amine or amide; exposure; development BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US disclosed
EP-0386514-A2 Transparent polymer blend and its use in moulding compositions, articles, films, coatings, adhesives and in light-sensitive registration material BASF Aktiengesellschaft (DE) 1990-09-12 EP disclosed
EP-0223114-B1 COMPOSITIONS RETICULATED BY PHOTOPOLYMERIZATION BASF Aktiengesellschaft (DE) 1990-08-08 EP disclosed
US-4946758-A RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING BASF AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed
EP-0367086-A1 Light-sensitive recording material BASF Aktiengesellschaft (DE) 1990-05-09 EP disclosed
US-4900795-A PHOTOPOLMERIZABLE POLYMER COMPRISING ETHYLENE, (METH)ACRYLIC ACID AND VINYL OR ACRYLATE MONOMER NEUTRALIZED BY A CYCLIC AMINE OR HYDROXY-CONTAINING AMINE; PHOTORESISTS; PRINTING PLATES; OZONE RESISTANCE; ELONGATION; TENSILE STRENGTH BASF AKTIENGESELLSCHAFT (DE) 1990-02-13 US disclosed
US-4877715-A STORAGE STABLE, NONTACKY, FLEXIBLE BASF AKTIENGESELLSCHAFT (DE) 1989-10-31 US disclosed
EP-0293750-A2 Polymer ammonium salts BASF Aktiengesellschaft (DE) 1988-12-07 EP disclosed
US-4777115-A PHOTOINITIATOR, UNSATURATED MONOMERS; LIGHT SENSITIVE ELEMENTS BASF AKTIENGESELLSCHAFT (DE) 1988-10-11 US disclosed
US-4762892-A ETHYLENE-ACRYLIC OR METHACRYLIC ACID-ALKYL ACRYLATE MODIFIED TO CONTAIN UNSATURATED SIDE CHAINS BASF AKTIENGESELLSCHAFT (DE) 1988-08-09 US disclosed
EP-0231002-A2 Crosslinkable solid rubbery polymers BASF Aktiengesellschaft (DE) 1987-08-05 EP disclosed
EP-0223114-A2 Compositions reticulated by photopolymerization BASF Aktiengesellschaft (DE) 1987-05-27 EP disclosed