SCHEMBL9350252

SCHEMBL9350252

Oc1ccc2ccc3c(O)cccc3c2c1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.52
ESR1 P03372 6/20 0.48
ESR2 Q92731 6/20 0.48
HSD17B1 P14061 2/20 0.48
HSD17B2 P37059 2/20 0.48
MCL1 Q07820 1/20 0.47
CTDSP1 Q9GZU7 1/20 0.47
TRPM4 Q8TD43 1/20 0.43
CDK4 P11802 1/20 0.43
CCND1 P24385 1/20 0.43
PLAU P00749 1/20 0.42
IDO1 P14902 1/20 0.42
APP P05067 1/20 0.41
MAPT P10636 1/20 0.41
THRB P10828 1/20 0.41
HPGD P15428 1/20 0.41
ALOX15 P16050 1/20 0.41
TSHR P16473 1/20 0.41
CASP1 P29466 1/20 0.41
SNCA P37840 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9353832 0.88 TRPM4 (0.54) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL29738648 0.85 CTDSP1 (0.63) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL29616 0.85 CTDSP1 (0.63) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL29352754 0.85 CTDSP1 (0.63) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL18241092 0.85 CYP1A2 (0.58) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL14809442 0.83 HPRT1 (0.64) CYP1A2MCL1TRPM4CDK4CCND1
SCHEMBL26132517 0.83 HPRT1 (0.64) CYP1A2MCL1TRPM4CDK4CCND1
SCHEMBL8061629 0.83 CYP1A2 (0.56) CYP1A2ESR1ESR2HSD17B1HSD17B2
Hydrogen Sulfide SCHEMBL8466036 0.83 CTDSP1 (0.61) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL8675127 0.82 HSD17B1 (0.61) CYP1A2ESR1ESR2HSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106019722-B Liquid crystal display panel 夏普株式会社 2019-05-17 CN disclosed
CN-105102408-B Novel triphenylene derivative compound and organic light-emitting element using same 株式会社东进世美肯 2018-07-10 CN disclosed
CN-104903363-B Monomer, liquid-crystal composition, the manufacture method of liquid crystal display device and liquid crystal display device 夏普株式会社 2018-05-04 CN disclosed
CN-107109056-A Resin film formation composition and resin film 日产化学工业株式会社 2017-08-29 CN disclosed
CN-107037635-A The manufacture method of liquid crystal display device 夏普株式会社 2017-08-11 CN disclosed
CN-106873248-A Liquid crystal display panel and liquid crystal display device 夏普株式会社 2017-06-20 CN disclosed
US-9676907-B2 Methods and systems of graft polymerization on a functionalized substrate ASPEN RESEARCH CORPORATION (US) 2017-06-13 US disclosed
CN-106662767-A Liquid-crystal display 夏普株式会社 2017-05-10 CN disclosed
CN-103765305-B Liquid crystal display panel and liquid crystal display device 夏普株式会社 2017-04-12 CN disclosed
CN-103718092-B Liquid crystal indicator 默克专利有限公司 2017-03-29 CN disclosed
US-20140296366-A1 METHODS AND SYSTEMS OF GRAFT POLYMERIZATION ON A FUNCTIONALIZED SUBSTRATE ASPEN RESEARCH CORPORATION (US) 2014-10-02 US disclosed
CN-103906775-A Methods and systems of graft polymerization on functionalized substrate ASPEN RES CORP 2014-07-02 CN disclosed
US-20130135570-A1 COMPOSITION FOR FORMING LIQUID CRYSTAL LAYER, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE TOYO GOSEI CO., LTD. (JP) 2013-05-30 US disclosed
US-20130135570-A1 COMPOSITION FOR FORMING LIQUID CRYSTAL LAYER, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE TOYO GOSEI CO., LTD. (JP) 2013-05-30 US disclosed
US-20130135570-A1 COMPOSITION FOR FORMING LIQUID CRYSTAL LAYER, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE TOYO GOSEI CO., LTD. (JP) 2013-05-30 US disclosed
EP-0320227-B1 Method of preventing polymer-scale formation SHINETSU CHEMICAL CO (JP) 1994-09-07 EP disclosed
CN-1023324-C Method of preventing polymer-scale formation SHINETSU CHEMICAL CO (JP) 1993-12-29 CN disclosed
US-4933399-A COATING INSIDE OF VESSEL WITH A CATIONIC DYE, DRYING, COATING WITH AN ANIONIC OR AMPHOTERIC POLYMER OR A HYDROXYL-CONTAINING COMPOUND IN A SOLVENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 1990-06-12 US disclosed
CN-1035118-A A kind of method that forms polymer-scale that stops SHINETSU CHEMICAL CO (JP) 1989-08-30 CN disclosed
EP-0320227-A2 Method of preventing polymer-scale formation Shin-Etsu Chemical Co., Ltd. (JP) 1989-06-14 EP disclosed