SCHEMBL9350296

SCHEMBL9350296

COCS(N)(=O)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14513786 0.72
SCHEMBL1892675 0.72
SCHEMBL5350464 0.69
SCHEMBL778969 0.69
SCHEMBL21306796 0.69
SCHEMBL668970 0.69
SCHEMBL23462257 0.67
Hydrochloric Acid SCHEMBL29678816 0.67
SCHEMBL19945246 0.67
SCHEMBL19239952 0.67 CA2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250188026-A1 EP2 Antagonist Compounds RESERVOIR NEUROSCIENCE, INC. 2025-06-12 US disclosed
US-12297171-B2 EP2 antagonist compounds RESERVOIR NEUROSCIENCE, INC. (US) 2025-05-13 US disclosed
US-20240182411-A1 EP2 ANTAGONIST COMPOUNDS RESERVOIR NEUROSCIENCE, INC. 2024-06-06 US disclosed
EP-4359399-A1 EP2 ANTAGONIST COMPOUNDS Reservoir Neuroscience, Inc. (US) 2024-05-01 EP disclosed
WO-2022272062-A1 EP2 ANTAGONIST COMPOUNDS RESERVOIR NEUROSCIENCE, INC. (US) 2022-12-29 WO disclosed
WO-2022272062-A1 EP2 ANTAGONIST COMPOUNDS RESERVOIR NEUROSCIENCE, INC. (US) 2022-12-29 WO disclosed
WO-2022187693-A1 COVALENT CDK2-BINDING COMPOUNDS FOR THERAPEUTIC PURPOSES UMBRA THERAPEUTICS INC. (US) 2022-09-09 WO disclosed
CN-106029813-B Laminating adhesive, the manufacturing method of laminated film, laminated film and retort pouch material 三井化学株式会社 2019-08-02 CN disclosed
CN-106062026-B Isocyanurate composition 三井化学株式会社 2019-05-17 CN disclosed
CN-106062024-B Isocyanurate composition 三井化学株式会社 2018-10-30 CN disclosed
US-4268605-A Stabilization of organic substrate materials including photographic dye images against the action of light FUJI PHOTO FILM CO., LTD. (JP) 1981-05-19 US disclosed
US-4256817-A TUNGSTEN-NICKEL SULFIDE COMPLEX SALT FUJI PHOTO FILM CO., LTD. (JP) 1981-03-17 US disclosed
US-4254195-A BY ADDITION OF A COMPLEX METAL COMPOUND IN ASSOCIATION WITH THE SUBSTRATE FUJI PHOTO FILM CO., LTD. (JP) 1981-03-03 US disclosed
US-4248949-A WITH A COEXISING METAL COMPLEX OF PYRIDINE, QUINOLINE OR ISOQUINOLINE COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 1981-02-03 US disclosed
US-4246329-A METAL COMPLEX AS STABILIZER FUJI PHOTO FILM CO., LTD. (JP) 1981-01-20 US disclosed
US-4246330-A METAL COMPLEX SALT COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1981-01-20 US disclosed
US-4245018-A CHELATES OF COPPER, COBALT, NICKEL, PALLADIUM, OR PLATINUM FUJI PHOTO FILM CO., LTD. (JP) 1981-01-13 US disclosed
US-4242430-A METAL COMPLESES OF 1,2-PHENYLENEDIAMINES FUJI PHOTO FILM CO., LTD. (JP) 1980-12-30 US disclosed
US-4242431-A 1,2-DIAMINO-1,2-DICYANOETHYLENE METAL COMPLESES FUJI PHOTO FILM CO., LTD. (JP) 1980-12-30 US disclosed
US-4241155-A METAL CHELATES CONTAINING PHOSPHORUS AND SULFUR FUJI PHOTO FILM CO., LTD. (JP) 1980-12-23 US disclosed