Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.46 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.46 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | DPP4 | P27487 | 2/20 | 0.45 |
| ▸ | F2 | P00734 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | MIF | P14174 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isopropylbenzene SCHEMBL3672803 | 0.97 | TAAR1 (0.50) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL8431863 | 0.97 | TAAR1 (0.50) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL27727769 | 0.97 | TAAR1 (0.50) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL87809 | 0.97 | TAAR1 (0.50) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL11254813 | 0.97 | — | — | |
| Isopropylbenzene SCHEMBL6568 | 0.97 | — | — | |
| Isopropylbenzene SCHEMBL23421101 | 0.93 | ADRA2C (0.52) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL18614726 | 0.93 | ADRA2C (0.52) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL4795494 | 0.93 | ADRA2C (0.52) | TAAR1KDM4EADRA2AADRA2CCYP2D6 | |
| Isopropylbenzene SCHEMBL3198660 | 0.93 | TAAR1 (0.48) | TAAR1KDM4EADRA2AADRA2CCYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230163022-A1 | HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE COMPRISING AN ISOLATION REGION | GLOBALWAFERS CO., LTD. (TW) | 2023-05-25 | — | — | US | disclosed |
| US-11587825-B2 | Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate | GLOBALWAFERS CO., LTD. (TW) | 2023-02-21 | — | — | US | disclosed |
| US-11380576-B2 | Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate | GLOBALWAFERS CO., LTD. (TW) | 2022-07-05 | — | — | US | disclosed |
| US-20210035855-A1 | METHOD OF PREPARING AN ISOLATION REGION IN A HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE | SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H) (SG) | 2021-02-04 | — | — | US | disclosed |
| US-20210013091-A1 | METHOD OF PREPARING AN ISOLATION REGION IN A HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE | SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H) (SG) | 2021-01-14 | — | — | US | disclosed |
| US-10825718-B2 | Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate | GLOBALWAFERS CO., LTD. (TW) | 2020-11-03 | — | — | US | disclosed |
| US-10475695-B2 | High resistivity silicon-on-insulator substrate comprising an isolation region | GLOBALWAFERS CO., LTD. (TW) | 2019-11-12 | — | — | US | disclosed |
| US-20190214294-A1 | METHOD OF PREPARING AN ISOLATION REGION IN A HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE | GLOBALWAFERS CO., LTD. (TW) | 2019-07-11 | — | — | US | disclosed |
| US-20180174892-A1 | HIGH RESISTIVITY SILICON-ON-INSULATOR SUBSTRATE COMPRISING AN ISOLATION REGION | GLOBALWAFERS CO., LTD. (TW) | 2018-06-21 | — | — | US | disclosed |
| EP-0324958-B1 | Process for making alkyl arsine compounds | AMERICAN CYANAMID CO (US) | 1994-09-21 | — | — | EP | disclosed |
| US-5003093-A | Process for making alkyl arsine compounds | AMERICAN CYANAMID | 1991-03-26 | — | — | US | disclosed |