SCHEMBL9355987

SCHEMBL9355987

c1ccc(C2=NN(c3ccccc3)C(c3c4ccccc4cc4ccccc34)C2)cc1

nearest known ligand 0.67

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ EGFR P00533 13/20 0.67
▸ ERBB2 P04626 13/20 0.67
▸ L3MBTL1 Q9Y468 3/20 0.53
▸ MEN1 O00255 3/20 0.53
▸ KMT2A Q03164 3/20 0.53
▸ ATM Q13315 2/20 0.53
▸ RXFP1 Q9HBX9 1/20 0.53
▸ ERBB3 P21860 2/20 0.53
▸ KDR P35968 2/20 0.53
▸ PTK2 Q05397 2/20 0.53
▸ KDM4E B2RXH2 1/20 0.51
▸ ALDH1A1 P00352 1/20 0.51
▸ GLA P06280 1/20 0.51
▸ GAA P10253 1/20 0.51
▸ HPGD P15428 1/20 0.51
▸ MAPK1 P28482 1/20 0.51
▸ SMN1; SMN2 Q16637 1/20 0.51
▸ MMP2 P08253 2/20 0.51
▸ MMP9 P14780 2/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27837702 0.86 MEN1 (0.64) EGFRERBB2L3MBTL1MEN1KMT2A
SCHEMBL27889192 0.83 EGFR (0.71) EGFRERBB2L3MBTL1MEN1KMT2A
SCHEMBL31191423 0.83 EGFR (0.71) EGFRERBB2L3MBTL1MEN1KMT2A
SCHEMBL9356235 0.80 EGFR (1.00) EGFRERBB2ERBB3KDRPTK2
SCHEMBL1186232 0.79 EGFR (0.92) EGFRERBB2L3MBTL1MEN1KMT2A
SCHEMBL27986738 0.78 ACHE (0.64) KDM4E
SCHEMBL9568963 0.77 EGFR (1.00) EGFRERBB2ERBB3KDRPTK2
SCHEMBL23052404 0.77 MEN1 (0.73) EGFRERBB2L3MBTL1MEN1KMT2A
SCHEMBL395608 0.77 MEN1 (0.73) EGFRERBB2L3MBTL1MEN1KMT2A
SCHEMBL13680425 0.77 EGFR (0.75) EGFRERBB2L3MBTL1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0451561-B1 Photopolymerisable mixture and recording material made from it MORTON INT INC (US) 1994-11-09 — — EP disclosed
US-5221595-A Printing plates, photoresist; high photosensitivity, acid resistance HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-22 — — US disclosed
EP-0530095-A1 Improved sensitization of photopolymerizable compositions MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1993-03-03 — — EP disclosed
EP-0451561-A1 Photopolymerisable mixture and recording material made from it MORTON INTERNATIONAL, INC. (US) 1991-10-16 — — EP disclosed
US-4250053-A WITH FLUORESCENT COMPOUND MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1981-02-10 — — US disclosed
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