Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 14/20 | 0.63 |
| ▸ | ERBB2 | P04626 | 14/20 | 0.63 |
| ▸ | ERBB3 | P21860 | 3/20 | 0.58 |
| ▸ | KDR | P35968 | 3/20 | 0.58 |
| ▸ | PTK2 | Q05397 | 3/20 | 0.58 |
| ▸ | MMP2 | P08253 | 1/20 | 0.49 |
| ▸ | MMP9 | P14780 | 1/20 | 0.49 |
| ▸ | ACHE | P22303 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11212856 | 0.83 | EGFR (0.75) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL31429976 | 0.83 | EGFR (0.75) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL9568963 | 0.78 | EGFR (1.00) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL9356499 | 0.78 | EGFR (0.86) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL27889192 | 0.75 | EGFR (0.71) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL31191423 | 0.75 | EGFR (0.71) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL9356235 | 0.75 | EGFR (1.00) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL13680428 | 0.74 | EGFR (0.94) | EGFRERBB2ERBB3KDRPTK2 | |
| SCHEMBL9649368 | 0.74 | MAOB (0.69) | EGFRERBB2 | |
| SCHEMBL1186232 | 0.74 | EGFR (0.92) | EGFRERBB2ERBB3KDRPTK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0451561-B1 | Photopolymerisable mixture and recording material made from it | MORTON INT INC (US) | 1994-11-09 | — | — | EP | disclosed |
| US-5221595-A | Printing plates, photoresist; high photosensitivity, acid resistance | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-06-22 | — | — | US | disclosed |
| EP-0451561-A1 | Photopolymerisable mixture and recording material made from it | MORTON INTERNATIONAL, INC. (US) | 1991-10-16 | — | — | EP | disclosed |