SCHEMBL9356568

SCHEMBL9356568

CC(C)C1CC(c2ccccc2)=NN1c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ATM Q13315 4/20 0.52
▸ L3MBTL1 Q9Y468 3/20 0.52
▸ KDM4E B2RXH2 2/20 0.52
▸ ALDH1A1 P00352 2/20 0.52
▸ GLA P06280 1/20 0.52
▸ GAA P10253 1/20 0.52
▸ HPGD P15428 1/20 0.52
▸ MAPK1 P28482 1/20 0.52
▸ SMN1; SMN2 Q16637 1/20 0.52
▸ MEN1 O00255 7/20 0.51
▸ KMT2A Q03164 7/20 0.51
▸ RXFP1 Q9HBX9 1/20 0.51
▸ EGFR P00533 4/20 0.50
▸ ERBB2 P04626 4/20 0.50
▸ NR3C2 P08235 1/20 0.46
▸ ERBB3 P21860 1/20 0.45
▸ KDR P35968 1/20 0.45
▸ PTK2 Q05397 1/20 0.45
▸ LMNA P02545 1/20 0.44
▸ MAPT P10636 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7719090 0.79 PRKCZ (0.35) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL11209096 0.78 ATM (0.60) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL15300830 0.75 EGFR (0.65) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL23052404 0.75 MEN1 (0.73) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL2606271 0.75 MEN1 (0.55) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL13680425 0.75 EGFR (0.75) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL395608 0.75 MEN1 (0.73) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL10019250 0.74 NR3C2 (0.44) ATML3MBTL1GLAHPGDMEN1
SCHEMBL13680429 0.72 EGFR (0.71) ATML3MBTL1KDM4EALDH1A1GLA
SCHEMBL10361833 0.72 MEN1 (0.69) ATML3MBTL1KDM4EALDH1A1GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0451561-B1 Photopolymerisable mixture and recording material made from it MORTON INT INC (US) 1994-11-09 — — EP disclosed
US-5221595-A Printing plates, photoresist; high photosensitivity, acid resistance HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-22 — — US disclosed
EP-0451561-A1 Photopolymerisable mixture and recording material made from it MORTON INTERNATIONAL, INC. (US) 1991-10-16 — — EP disclosed
US-4250053-A WITH FLUORESCENT COMPOUND MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1981-02-10 — — US disclosed
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