⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL27467623 | 0.83 | TSHR (0.32) | — | |
| SCHEMBL13936410 | 0.67 | — | — | |
| SCHEMBL19004840 | 0.67 | — | — | |
| SCHEMBL13970704 | 0.62 | — | — | |
| SCHEMBL13314641 | 0.60 | — | — | |
| SCHEMBL575991 | 0.53 | — | — | |
| SCHEMBL2552134 | 0.53 | — | — | |
| SCHEMBL50200 | 0.53 | — | — | |
| Water SCHEMBL5398689 | 0.50 | — | — | |
| SCHEMBL3691611 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2102 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120059264-A | Universal functional coating material and preparation method thereof | 陕西师范大学 | 2025-05-30 | — | — | CN | claimed |
| CN-119462448-A | Method for preparing vinyl thioether compound under ball milling condition | 扬州大学 | 2025-02-18 | — | — | CN | claimed |
| CN-115377304-B | Light emitting device and method of manufacturing the same | 广东聚华印刷显示技术有限公司 | 2025-01-24 | — | — | CN | claimed |
| CN-119081358-A | Two-component adhesive for jet printing, jet printing apparatus and printing method | 中国科学院金属研究所 | 2024-12-06 | — | — | CN | claimed |
| CN-118465884-A | Optical antireflection film, window glass and vehicle | 福耀玻璃工业集团股份有限公司 | 2024-08-09 | — | — | CN | claimed |
| CN-114891019-B | Continuous flow preparation method of vinyl thioether compound | 复旦大学 | 2024-06-04 | — | — | CN | claimed |
| US-20240152047-A1 | HIGH REFRACTIVE INDEX MATERIALS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-05-09 | — | — | US | claimed |
| CN-117866195-A | High refractive index material | 罗门哈斯电子材料有限责任公司 | 2024-04-12 | — | — | CN | claimed |
| CN-115785855-B | SCA optical cement, glass and vehicle | 福耀玻璃工业集团股份有限公司 | 2023-10-24 | — | — | CN | claimed |
| CN-115611789-B | Method for in-situ selective synthesis of vinyl thioether and 2-methylbenzothiazole derivatives by calcium carbide and product thereof | 内蒙古工业大学 | 2023-09-15 | — | — | CN | claimed |
| EP-0321499-A1 | COVALENTLY BONDED ACTIVE AGENTS WITH CARBONIUM ION BASE GROUPS. | HELWING ROBERT F | 1989-06-28 | — | — | EP | claimed |
| US-4842868-A | CONTROLLED RELEASE OF DRUGS, INSECTICIDES | HELWING ROBERT F (US) | 1989-06-27 | — | — | US | claimed |
| WO-1988002252-A1 | COVALENTLY BONDED ACTIVE AGENTS WITH CARBONIUM ION BASE GROUPS | HELWING ROBERT F (US) | 1988-04-07 | — | — | WO | claimed |
| EP-0233493-A2 | Process for producing ribonucleosides | Yamasa Shoyu Kabushiki Kaisha (JP) | 1987-08-26 | — | — | EP | claimed |
| US-4647475-A | Method for making multilayer light sensitive electron radiation cured coating | FUJI PHOTO FILM CO., LTD. (JP) | 1987-03-03 | — | — | US | claimed |
| US-4599288-A | Electrophotographic plate-making material | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-08 | — | — | US | claimed |
| EP-0168636-A2 | Method for making multilayer coating | FUJI PHOTO FILM CO., LTD. (JP) | 1986-01-22 | — | — | EP | claimed |
| EP-0119612-A2 | Electrophotographic plate-making material | FUJI PHOTO FILM CO., LTD. (JP) | 1984-09-26 | — | — | EP | claimed |
| US-4097665-A | Diacylnucleosides and process for preparing the same | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) | 1978-06-27 | — | — | US | claimed |
| US-4073968-A | IRRADIATING A PHOTOCURABLE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-14 | — | — | US | claimed |