SCHEMBL939115

SCHEMBL939115

O=[SiH2].[Ti]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27785132 0.89
SCHEMBL29004170 0.89
SCHEMBL3283087 0.89
SCHEMBL5092216 0.89
SCHEMBL4189741 0.89
SCHEMBL4531772 0.89
SCHEMBL16335160 0.89
SCHEMBL5586427 0.89
SCHEMBL1170274 0.89
SCHEMBL27690092 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 843 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12598916-B2 MRAM device with self-aligned bottom electrodes INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2026-04-07 US claimed
US-20260068548-A1 RESISTIVE SWITCHING STRUCTURE TO IMPROVE RRAM TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2026-03-05 US claimed
US-20260068546-A1 MEMRISTIVE COMPUTING SCHEMES IN THE BACK-END-OF-THE-LINE APPLIED MATERIALS, INC. (US) 2026-03-05 US claimed
US-12538771-B2 Barrier layer for an interconnect structure TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-01-27 US claimed
US-20250306276-A1 PROCESS INTEGRATION FLOW FOR STAIRCASE GRATINGS APPLIED MATERIALS, INC. 2025-10-02 US claimed
US-20250291109-A1 SLAB WAVEGUIDE LAYER FOR ENHANCED NEAR-EYE-DISPLAY SURFACE RELIEF GRATING LIGHTGUIDE APPLIED MATERIALS, INC. 2025-09-18 US claimed
EP-4609240-A1 SLAB WAVEGUIDE LAYER FOR ENHANCED NEAR-EYE-DISPLAY SURFACE RELIEF GRATING LIGHTGUIDE Applied Materials, Inc. (US) 2025-09-03 EP claimed
US-12347695-B2 Methods for controlling contact resistance in cobalt-titanium structures APPLIED MATERIALS, INC. (US) 2025-07-01 US claimed
US-12345918-B2 Slab waveguide layer for enhanced near-eye-display surface relief grating lightguide APPLIED MATERIALS, INC. (US) 2025-07-01 US claimed
CN-120153295-A Plate-shaped waveguide layer for enhanced near-eye display surface relief grating light guide 应用材料公司 2025-06-13 CN claimed
US-20060223337-A1 Atomic layer deposited titanium silicon oxide films MICRON TECHNOLOGY, INC. 2006-10-05 US claimed
CN-1826290-A Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials STARCK H C INC (US) 2006-08-30 CN claimed
CN-1765498-A Catalyst for preparing paraxylene by toluene selective disproportination CHINA PETROLEUM & CHEMICAL (CN) 2006-05-03 CN claimed
CN-1665753-A Transparent substrate comprising antiglare coating SAINT GOBAIN (FR) 2005-09-07 CN claimed
US-6674169-B2 Semiconductor device with titanium silicon oxide layer MICRON TECHNOLOGY, INC. 2004-01-06 US claimed
CN-1445262-A High hydrophilic polytitanium siloxane compound induced by photocatalysis and its preparing method XIE PINGBO (CN) 2003-10-01 CN claimed
US-20020019116-A1 Chemical vapor deposition using organometallic precursors SANDHU GURTEJ S (US) 2002-02-14 US claimed
US-20020009896-A1 Chemical vapor deposition using organometallic precursors SANDHU GURTEJ S (US) 2002-01-24 US claimed
US-6313035-B1 Chemical vapor deposition using organometallic precursors MICRON TECHNOLOGY, INC. 2001-11-06 US claimed
US-6075691-A Thin film capacitors and process for making them LUCENT TECHNOLOGIES INC. (US) 2000-06-13 US claimed