⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL617773 | 0.83 | — | — | |
| SCHEMBL973345 | 0.79 | — | — | |
| SCHEMBL2127597 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL5229862 | 0.76 | — | — | |
| SCHEMBL6244201 | 0.73 | — | — | |
| SCHEMBL10527678 | 0.73 | — | — | |
| Benzene SCHEMBL27382614 | 0.71 | — | — | |
| SCHEMBL8991847 | 0.71 | — | — | |
| SCHEMBL9508251 | 0.71 | — | — | |
| SCHEMBL942033 | 0.69 | LMNA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116727658-A | Preparation method of copper nano-particles, copper nano-particles and application of copper nano-particles | 深圳先进电子材料国际创新研究院 | 2023-09-12 | — | — | CN | claimed |
| CN-110256655-A | A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist | 苏州瑞红电子化学品有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-108084331-B | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2019-08-16 | — | — | CN | claimed |
| EP-3054459-B1 | ELECTRODE HAVING EXCELLENT LIGHT TRANSMITTANCE AND METHOD FOR MANUFACTURING SAME | ONES ORGANIC NANO ELECTRONIC SYSTEM CO LTD (KR) | 2018-07-11 | — | — | EP | claimed |
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | claimed |
| CN-103309160-B | Negative chemically amplified photoresist and imaging method thereof | KEMPUR MICROELECTRONICS, INC. (CN) | 2015-08-26 | — | — | CN | claimed |
| EP-1853671-B1 | CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF | INKTEC CO LTD (KR) | 2013-07-31 | — | — | EP | claimed |
| CN-102156385-B | Chemical amplification type i-linear positive photoresist composition containing 2,1,4-diazo naphthoquinone sulphonic acid phenolic ester | UNIV BEIJING NORMAL | 2012-10-10 | — | — | CN | claimed |
| US-7691294-B2 | Conductive inks and manufacturing method thereof | INKTEC CO., LTD. (KR) | 2010-04-06 | — | — | US | claimed |
| US-20080206488-A1 | Conductive Inks and Manufacturing Method Thereof | INKTEC CO., LTD. (KR) | 2008-08-28 | — | — | US | claimed |
| JP-2008531810-A | — | — | 2008-08-14 | — | — | JP | claimed |
| EP-1853671-A1 | CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF | Inktec Co., Ltd. (KR) | 2007-11-14 | — | — | EP | claimed |
| WO-2006093398-A1 | CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF | INKTEC CO., LTD. (KR) | 2006-09-08 | — | — | WO | claimed |
| EP-0250219-B1 | Method of storing photographic processing solution | KONISHIROKU PHOTO IND (JP) | 1994-03-30 | — | — | EP | claimed |
| US-4814260-A | USING DEVELOPER WITH SUBSTITUTED HYDROXYLAMINE PRESERVATIVE; BLEACH-FIXER WITH REDUCED AMOUNTS OF AMINOPOLYCARBOXYLIC ACID AND SULFITE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1989-03-21 | — | — | US | claimed |
| EP-0250219-A2 | Method of storing photographic processing solution | KONICA CORPORATION (JP) | 1987-12-23 | — | — | EP | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-20240030448-A1 | CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME | MIKUNI SHIKISO KABUSHIKI KAISHA (JP) | 2024-01-25 | — | — | US | disclosed |
| WO-1994008629-A1 | MR IMAGING COMPOSITIONS, BASED ON POLY(ALKYLENEOXIDE) | STERLING WINTHROP INC. (US) | 1994-04-28 | — | — | WO | disclosed |
| WO-1994009056-A1 | CHELATING POLYMERS | STERLING WINTHROP INC. (US) | 1994-04-28 | — | — | WO | disclosed |