Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 7/20 | 0.96 |
| ▸ | MAPK1 | P28482 | 6/20 | 0.96 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.96 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.96 |
| ▸ | TSHR | P16473 | 3/20 | 0.96 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.96 |
| ▸ | TP53 | P04637 | 2/20 | 0.96 |
| ▸ | MEN1 | O00255 | 9/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 9/20 | 0.59 |
| ▸ | MAPT | P10636 | 6/20 | 0.59 |
| ▸ | RAB9A | P51151 | 4/20 | 0.59 |
| ▸ | PKM | P14618 | 2/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.56 |
| ▸ | NPC1 | O15118 | 5/20 | 0.56 |
| ▸ | HBB | P68871 | 2/20 | 0.50 |
| ▸ | USP2 | O75604 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14437166 | 1.00 | TDP1 (0.96) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| SCHEMBL29539970 | 1.00 | TDP1 (0.96) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| SCHEMBL752490 | 1.00 | TDP1 (0.96) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| SCHEMBL29155111 | 0.98 | TDP1 (0.93) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| Hydrochloric Acid SCHEMBL29441860 | 0.98 | TDP1 (1.00) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| Lithium SCHEMBL30739531 | 0.98 | TDP1 (0.93) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| Hydrochloric Acid SCHEMBL9558913 | 0.98 | TDP1 (1.00) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| Hydrochloric Acid SCHEMBL1756337 | 0.98 | TDP1 (1.00) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| SCHEMBL29155112 | 0.98 | TDP1 (0.93) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR | |
| Hydrochloric Acid SCHEMBL136697 | 0.98 | TDP1 (1.00) | TDP1MAPK1CYP3A4SMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2000517-B1 | Multiple colour component adhesive system | AKEMI CHEMISCH TECH SPEZIALFAB (DE) | 2010-10-20 | — | — | EP | claimed |
| US-20080300321-A1 | MULTICOLOR COMPONENT ADHESIVE SYSTEM | AKEMI CHEMISCH TECHNISCHE SPEZIALFABRIK GMBH (DE) | 2008-12-04 | — | — | US | claimed |
| EP-0096319-B1 | METHOD FOR PREVENTING SCALE DEPOSITION IN THE POLYMERIZATION OF ETHYLENICALLY UNSATURATED MONOMERS | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-03-26 | — | — | EP | claimed |
| JP-11052386-A | — | — | None | — | — | JP | disclosed |
| CN-114539849-A | Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix | 阪田油墨株式会社 | 2022-05-27 | — | — | CN | disclosed |
| CN-107984936-B | Reusable writing material and preparation method thereof | 吉林大学 | 2022-05-06 | — | — | CN | disclosed |
| EP-3521927-B1 | POSITIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MANUFACTURING THE PRECURSOR AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2021-10-27 | — | — | EP | disclosed |
| EP-3410210-B1 | POSITIVE LITHOGRAPHIC PRINTING MASTER PLATE AND METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2020-10-21 | — | — | EP | disclosed |
| US-10695830-B2 | Copper powder, copper paste using same, conductive coating material, conductive sheet, and method for producing copper powder | SUMITOMO METAL MINING CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-10696801-B2 | Hydrate inhibitor carrying hydrogel | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2020-06-30 | — | — | US | disclosed |
| US-10654101-B2 | Silver-coated copper powder, copper paste using same, conductive coating material, conductive sheet, and method for producing silver-coated copper powder | SUMITOMO METAL MINING CO., LTD. (JP) | 2020-05-19 | — | — | US | disclosed |
| EP-0372967-A2 | Method of preventing polymer scale deposition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1990-06-13 | — | — | EP | disclosed |
| EP-0138660-B1 | METHOD FOR PREVENTING POLYMER SCALE DEPOSITION IN THE POLYMERIZATION OF AN ETHYLENICALLY UNSATURATED MONOMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1988-03-02 | — | — | EP | disclosed |
| EP-0096319-B1 | METHOD FOR PREVENTING SCALE DEPOSITION IN THE POLYMERIZATION OF ETHYLENICALLY UNSATURATED MONOMERS | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-03-26 | — | — | EP | disclosed |
| US-4542195-A | COATING REACTOR WITH CONDENSATION PRODUCT OF ANILINE AND NITROBENZENE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1985-09-17 | — | — | US | disclosed |
| US-4528336-A | Method for preventing polymer scale deposition in polymerization of ethylenically unsaturated monomers | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1985-07-09 | — | — | US | disclosed |
| EP-0138660-A1 | Method for preventing polymer scale deposition in the polymerization of an ethylenically unsaturated monomer | Shin-Etsu Chemical Co., Ltd. (JP) | 1985-04-24 | — | — | EP | disclosed |
| EP-0096319-A1 | Method for preventing scale deposition in the polymerization of ethylenically unsaturated monomers | Shin-Etsu Chemical Co., Ltd. (JP) | 1983-12-21 | — | — | EP | disclosed |
| EP-0062230-A2 | Method for preventing polymer scale deposition in the polymerization of ethylenically unsaturated monomers | Shin-Etsu Chemical Co., Ltd. (JP) | 1982-10-13 | — | — | EP | disclosed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | disclosed |