⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5389798 | 0.82 | — | — | |
| SCHEMBL9927409 | 0.79 | — | — | |
| SCHEMBL4399244 | 0.76 | — | — | |
| SCHEMBL13232343 | 0.76 | — | — | |
| SCHEMBL4403853 | 0.75 | — | — | |
| SCHEMBL9927404 | 0.71 | LMNA (0.33) | — | |
| SCHEMBL9927406 | 0.70 | LMNA (0.32) | — | |
| SCHEMBL9927411 | 0.69 | — | — | |
| SCHEMBL9927405 | 0.68 | — | — | |
| SCHEMBL21524625 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190346763-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-14 | — | — | US | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| US-10180627-B2 | Processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-01-15 | — | — | US | disclosed |
| EP-2189845-B1 | Compositions and processes for photolithography | ROHM & HAAS ELECT MAT (US) | 2017-08-02 | — | — | EP | disclosed |
| US-9507260-B2 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-11-29 | — | — | US | disclosed |
| EP-3051348-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | Rohm and Haas Electronic Materials LLC (US) | 2016-08-03 | — | — | EP | disclosed |
| EP-2293143-B1 | Novel photoresist compositions | ROHM & HAAS ELECT MAT (US) | 2015-09-02 | — | — | EP | disclosed |
| EP-2189846-B1 | Process for photolithography applying a photoresist composition comprising a block copolymer | ROHM & HAAS ELECT MAT (US) | 2015-04-22 | — | — | EP | disclosed |
| US-8975006-B2 | Compositions comprising carboxy component and processes for photolithography | WANG DEYAN (US) | 2015-03-10 | — | — | US | disclosed |
| EP-2293143-A2 | Novel resins and photoresist compositions comprising the same | Rohm and Haas Electronic Materials, L.L.C. (US) | 2011-03-09 | — | — | EP | disclosed |
| US-20100173245-A1 | Compositions comprising carboxy component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-07-08 | — | — | US | disclosed |
| EP-2189845-A2 | Compositions and processes for photolithography | Rohm and Haas Electronic Materials LLC (US) | 2010-05-26 | — | — | EP | disclosed |
| EP-2189846-A1 | Compositions comprising block polymer and processes for photolithography | Rohm and Haas Electronic Materials LLC (US) | 2010-05-26 | — | — | EP | disclosed |
| EP-2189847-A2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | Rohm and Haas Electronic Materials LLC (US) | 2010-05-26 | — | — | EP | disclosed |
| US-7592125-B2 | Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises hydroxy naphthyl groups and a second cross-linked resin; reduced line edge roughness | ROHM AND HAAS ELECTRIC MATERIALS LLC (US) | 2009-09-22 | — | — | US | disclosed |
| US-20080032232-A1 | Novel resins and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2008-02-07 | — | — | US | disclosed |
| US-7244542-B2 | Resins and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2007-07-17 | — | — | US | disclosed |
| EP-1684120-A1 | Photresist compositions comprising resin blends | Rohm and Haas Electronic Materials LLC (US) | 2006-07-26 | — | — | EP | disclosed |
| US-20060160022-A1 | Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises carbocyclic aryl units with hetero substitution and a second cross-linked resin | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-07-20 | — | — | US | disclosed |
| US-20040038150-A1 | Novel resins and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2004-02-26 | — | — | US | disclosed |