⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8751484 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL1187046 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL8751470 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL1706788 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL1900729 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL1813583 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL2321510 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL8751473 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL7067130 | 0.98 | ALDH1A1 (0.53) | — | |
| SCHEMBL28047189 | 0.98 | ALDH1A1 (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9306133-B2 | Optical semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-05 | — | — | US | disclosed |
| CN-102875789-B | A kind of polyether block copolymer and preparation method thereof | CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2015-10-07 | — | — | CN | disclosed |
| US-8889809-B2 | Cycloalkyl group-containing silicone resin composition and a method of using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8481656-B2 | Silicone resin composition and optical semiconductor device using the composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-09 | — | — | US | disclosed |
| CN-103097129-A | Multilayered structure, laminate and methods for producing same | KURARAY CO | 2013-05-08 | — | — | CN | disclosed |
| US-8431953-B2 | Silicone resin composition and an optical semiconductor device making use of the composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20130056786-A1 | OPTICAL SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| CN-102875789-A | Polyether block copolymer and preparation method thereof | CHANGCHUN APPLIED CHEMISTRY | 2013-01-16 | — | — | CN | disclosed |
| US-20120256325-A1 | SILICONE RESIN COMPOSITION AND OPTICAL SEMICONDUCTOR DEVICE USING THE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120184663-A1 | SILICONE RESIN COMPOSITION AND AN OPTICAL SEMICONDUCTOR DEVICE MAKING USE OF THE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| CN-100586991-C | Multilayered pellet comprising ethylene/vinyl alcohol copolymer resin compositions | KURARAY CO | 2010-02-03 | — | — | CN | disclosed |
| CN-101010362-A | Multilayered pellet comprising ethylene/vinyl alcohol copolymer resin compositions | KURARAY CO (JP) | 2007-08-01 | — | — | CN | disclosed |
| WO-2007028294-A1 | A DEVELOPER SOLUTION FOR PHOTORESIST | BYD COMPANY LIMITED (CN) | 2007-03-15 | — | — | WO | disclosed |
| CN-1294198-C | Resin composition and multi-layer structures | KURARAY CO (JP) | 2007-01-10 | — | — | CN | disclosed |
| CN-1231501-C | Modified ethylene-vinyl alcohol copolymer and method for producing same | KURARAY CO (JP) | 2005-12-14 | — | — | CN | disclosed |
| CN-1649956-A | Resin composition and multi-layer structures | KURARAY CO (JP) | 2005-08-03 | — | — | CN | disclosed |
| CN-1464883-A | Modified ethylene-vinyl alcohol copolymer and method for producing same | KURARAY CO (JP) | 2003-12-31 | — | — | CN | disclosed |
| EP-0426944-B1 | Cleaning method for removing rosin-base solder flux | ARAKAWA CHEM IND (JP) | 1997-04-09 | — | — | EP | disclosed |
| US-5096504-A | Contacting with nonionic surfactant, ethylene oxide-alcohol adduct or polyoxyethylene glycol | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1992-03-17 | — | — | US | disclosed |
| EP-0426944-A1 | Cleaning agent for rosin-base solder flux | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 1991-05-15 | — | — | EP | disclosed |