SCHEMBL9405666

SCHEMBL9405666

F[CH]C(F)(F)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6470189 0.74
SCHEMBL17420824 0.70
SCHEMBL8497652 0.70
SCHEMBL8497649 0.70
SCHEMBL17838917 0.70
SCHEMBL17838916 0.70
SCHEMBL14784756 0.70
SCHEMBL323342 0.67
SCHEMBL578570 0.67
SCHEMBL900190 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-6003524-A None JP disclosed
CN-110461887-A Cured film is formed with composition, orientation material and phase difference material NISSAN CHEMICAL CORP 2019-11-15 CN disclosed
CN-110461964-A Cured film is formed with composition, orientation material and phase difference material NISSAN CHEMICAL CORP 2019-11-15 CN disclosed
CN-109476926-A Polymer composition 日产化学株式会社 2019-03-15 CN disclosed
CN-109154685-A Both alignment layers form composition 日产化学株式会社 2019-01-04 CN disclosed
CN-109153857-A Polarizing layer forms composition 日产化学株式会社 2019-01-04 CN disclosed
CN-107615148-A Liquid crystal aligning agent for photo-alignment, alignment material and phase difference material 日产化学工业株式会社 2018-01-19 CN disclosed
CN-107429082-A Composition for forming cured film, alignment material, and phase difference material 日产化学工业株式会社 2017-12-01 CN disclosed
CN-104072394-B The manufacture method of nitrile compound 住友化学株式会社 2017-04-05 CN disclosed
EP-2917201-A1 DIHYDROTHIOPHENE DERIVATIVES AS INSECTICIDAL COMPOUNDS Syngenta Participations AG (CH) 2015-09-16 EP disclosed
CN-104072394-A Method for producing a nitrile compound SUMITOMO CHEMICAL CO 2014-10-01 CN disclosed
EP-2755969-A1 ISOTHIAZOLINE DERIVATIVES AS INSECTICIDAL COMPOUNDS Syngenta Participations AG (CH) 2014-07-23 EP disclosed
WO-2014072480-A1 DIHYDROTHIOPHENE DERIVATIVES AS INSECTICIDAL COMPOUNDS SYNGENTA PARTICIPATIONS AG (CH) 2014-05-15 WO disclosed
CN-103237793-A Pyrazole compound having therapeutic effect on multiple myeloma NISSAN CHEMICAL IND LTD 2013-08-07 CN disclosed
WO-2013037626-A1 ISOTHIAZOLINE DERIVATIVES AS INSECTICIDAL COMPOUNDS SYNGENTA PARTICIPATIONS AG (CH) 2013-03-21 WO disclosed
CN-101400662-B Substituted isoxazoline compound and pest control agent NISSAN CHEMICAL IND LTD 2012-11-14 CN disclosed
CN-102405221-A Process for production of 2-azaadamantane compound from bicyclocarbamate compound NISSAN CHEMICAL IND LTD 2012-04-04 CN disclosed
CN-101790511-A Halogen-containing organosulfur compounds and uses thereof SUMITOMO CHEMICAL CO 2010-07-28 CN disclosed
JP-H063524-A OPTICAL PHASE DIFFERENCE PLATE KUREHA CHEM IND CO LTD 1994-01-14 JP disclosed
US-5188759-A HALOACETYLENE DERIVATIVES MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1993-02-23 US disclosed