SCHEMBL94083

SCHEMBL94083

C[SiH](C)O[Si](O[SiH](C)C)(O[Si](O[SiH](C)C)(O[SiH](C)C)c1ccccc1)c1ccccc1

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL94175 0.91 ESR1 (0.33) ESR1ESR2
SCHEMBL15722867 0.90 ESR1 (0.31) ESR1ESR2
SCHEMBL18416013 0.90
SCHEMBL3438614 0.90 ESR1 (0.32) ESR1ESR2
SCHEMBL94043 0.90 ESR1 (0.32) ESR1ESR2
SCHEMBL20493844 0.88 ESR1 (0.32) ESR1ESR2
SCHEMBL16204576 0.86
SCHEMBL17248004 0.86
SCHEMBL5701660 0.84 POLB (0.33) ESR1ESR2
SCHEMBL1928068 0.84 ESR1 (0.30) ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
US-20230078587-A1 CURABLE SILOXANE RESIN COMPOSITION KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2023-03-16 US claimed
CN-115353334-A Environment-friendly concrete resistant to chloride ion permeation and preparation method thereof 温州华邦混凝土有限公司 2022-11-18 CN claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
EP-3830196-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2021-06-09 EP claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-6991887-B1 Photopatternable sorbent and functionalized films BATTELLE MEMORIAL INSTITUTE (US) 2006-01-31 US claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-6483981-B1 Single-channel attenuators MOLECULAR OPTOELECTRONICS CORP. 2002-11-19 US claimed
WO-2002001263-A2 SINGLE-CHANNEL ATTENUATORS MOLECULAR OPTOELECTRONICS CORPORATION (US) 2002-01-03 WO claimed
US-5217811-A Devices featuring silicone elastomers AT&T BELL LABORATORIES (US) 1993-06-08 US claimed
US-5188903-A Coatings THE DOW CHEMICAL COMPANY (US) 1993-02-23 US claimed
EP-0398573-A2 Devices featuring silicone elastomers AT&T Corp. (US) 1990-11-22 EP claimed