SCHEMBL94109

SCHEMBL94109

CCc1nnc(N)s1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formaldehyde SCHEMBL29033376 0.93 POLB (0.52)
SCHEMBL7161882 0.80
SCHEMBL1968819 0.78 ALDH1A1 (0.88)
SCHEMBL15472914 0.78 ALDH1A1 (0.61)
Hydrochloric Acid SCHEMBL20475888 0.77 ALDH1A1 (0.85)
SCHEMBL2208017 0.76
SCHEMBL7444937 0.75 POLB (0.64)
SCHEMBL11412602 0.75 ALDH1A1 (0.96)
SCHEMBL10842579 0.75 ALDH1A1 (0.48)
SCHEMBL11908941 0.75 ALDH1A1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 810 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12630744-B2 Polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2026-05-19 US claimed
US-20260042976-A1 COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MAT USA INC (US) 2026-02-12 US claimed
EP-4653506-A1 CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A, Inc. (US) 2025-11-26 EP claimed
EP-4626996-A1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A, Inc. (US) 2025-10-08 EP claimed
EP-4359478-B1 SYSTEMS AND METHODS FOR COATING MULTI-LAYERED COATED METAL SUBSTRATES PRC DESOTO INT INC (US) 2025-08-06 EP claimed
EP-4562104-A1 COMPOSITIONS AND METHODS OF USE THEREOF Fujifilm Electronic Materials U.S.A., Inc. (US) 2025-06-04 EP claimed
US-20250075147-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NEW FLAVOR AND FRAGRANCE INGREDIENTS OSMO LABS, PBC 2025-03-06 US claimed
CN-118496734-A Preparation method and application of circulating self-repairing intelligent anti-corrosion paint for intelligent detection sensor in harsh environment 山东科技大学 2024-08-16 CN claimed
US-20240270985-A1 SYSTEMS AND METHODS FOR COATING MULTI-LAYERED COATED METAL SUBSTRATES PRC-DESOTO INTERNATIONAL, INC. (US) 2024-08-15 US claimed
CN-118414401-A Polishing composition and method of use 富士胶片电子材料美国有限公司 2024-07-30 CN claimed
EP-0743574-B1 Migration imaging members XEROX CORP (US) 2000-12-27 EP claimed
EP-0743573-B1 Method for obtaining image contrast migration imaging members XEROX CORP (US) 2000-09-06 EP claimed
WO-2000041518-A2 ELECTRODEPOSITION CHEMISTRY FOR FILLING OF APERTURES WITH REFLECTIVE METAL APPLIED MATERIALS, INC. (US) 2000-07-20 WO claimed
EP-0673784-B1 Recording sheets containing oxazole, isooxazole, oxazolidinone, oxazoline salts, morpholine, thiazole, thiazolidine, thiadiazole, and phenothiazine compounds XEROX CORP (US) 1999-10-27 EP claimed
EP-0743573-A2 Method for obtaining image contrast migration imaging members XEROX CORPORATION (US) 1996-11-20 EP claimed
EP-0743574-A2 Migration imaging members XEROX CORPORATION (US) 1996-11-20 EP claimed
US-5563014-A SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT XEROX CORPORATION (US) 1996-10-08 US claimed
US-5514505-A SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE XEROX CORPORATION (US) 1996-05-07 US claimed
EP-0673784-A2 Recording sheets containing oxazole, isooxazole, oxazolidinone, oxazoline salts, morpholine, thiazole, thiazolidine, thiadiazole, and phenothiazine compounds XEROX CORPORATION (US) 1995-09-27 EP claimed
US-4810397-A ALUMINUM COMPOUND, ACID, THIADIAZOLE OR TRIAZOLE UNION OIL COMPANY OF CALIFORNIA (US) 1989-03-07 US claimed