SCHEMBL94353

SCHEMBL94353

CC(N)(N)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tert-Butylamine SCHEMBL8051 0.83
SCHEMBL111550 0.83
SCHEMBL2385852 0.83 FDPS (0.33)
Tert-Butylamine SCHEMBL5736553 0.83
Tert-Butylamine SCHEMBL6064515 0.83 FDPS (0.33)
Tert-Butylamine SCHEMBL263850 0.77
Tert-Butylamine SCHEMBL7781705 0.77
Tert-Butylamine SCHEMBL4699299 0.77
Tert-Butylamine SCHEMBL20597076 0.77
SCHEMBL20678960 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 525 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118652368-B Water-absorbent resin, preparation method thereof and absorber 中国天辰工程有限公司 2024-12-03 CN claimed
CN-118652368-A Water-absorbent resin, preparation method thereof and absorber 中国天辰工程有限公司 2024-09-17 CN claimed
CN-118083984-B Preparation method of high-purity submicron spherical silica powder with good fluidity 江苏辉迈粉体科技有限公司 2024-07-23 CN claimed
CN-118083984-A Preparation method of high-purity submicron spherical silica powder with good fluidity 江苏辉迈粉体科技有限公司 2024-05-28 CN claimed
CN-114855237-B Preparation method of ZIF-8 doped high-corrosion-resistance micro-arc oxidation composite coating 四川轻化工大学 2024-01-23 CN claimed
US-20230350293-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-11-02 US claimed
EP-4220301-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN Young Chang Chemical Co., Ltd. (KR) 2023-08-02 EP claimed
CN-113529173-B Two-step texturing additive for preparing multi-layer pyramid monocrystalline silicon suede and application thereof 西安蓝桥新能源科技有限公司 2023-07-28 CN claimed
CN-116262994-A Moisture sensitive textured fabric 财团法人纺织产业综合研究所 2023-06-16 CN claimed
CN-116194842-A Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin 荣昌化学制品株式会社 2023-05-30 CN claimed
US-6239298-B1 REACTING A TRIGLYCERIDE, UNSATURATED ACID AND POLYHYDROXY OR POLYAMINO COMPOUND INTERNATIONAL LUBRICANTS INC. 2001-05-29 US claimed
EP-1093509-A1 FUEL LUBRICITY ADDITIVES INTERNATIONAL LUBRICANTS, INC. (US) 2001-04-25 EP claimed
WO-1999061563-A1 FUEL LUBRICITY ADDITIVES INTERNATIONAL LUBRICANTS, INC. (US) 1999-12-02 WO claimed
EP-0526334-B1 Electroless palladium plating composition OKUNO CHEM IND CO (JP) 1998-01-21 EP claimed
US-5292361-A Hypophosphite, ammonia or alkylamine, polyethyleneimine, aliphatic alkylamine OKUNO CHEMICAL INDUSTRIES CO., LTD. (JP) 1994-03-08 US claimed
EP-0526334-A2 Electroless palladium plating composition OKUNO CHEMICAL INDUSTRIES CO. LTD (JP) 1993-02-03 EP claimed
EP-0182940-B1 MANNICH BASE OIL ADDITIVES MOBIL OIL CORPORATION (US) 1990-04-11 EP claimed
US-4787996-A FRICTION RESISTANCE; LUBRICANTS MOBIL OIL CORPORATION (US) 1988-11-29 US claimed
EP-0182940-A1 Mannich base oil additives MOBIL OIL CORPORATION (US) 1986-06-04 EP claimed
US-4292411-A ORGANIC BISMUTH COMPOUND, PRIMARY OR SECONDARY AMINE S.A. PRB (BE) 1981-09-29 US claimed