Cupferron

Cupferron

SCHEMBL94436

O=NN(O)c1ccccc1.[Al]

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.54
ALOX15 P16050 1/20 0.54
NPSR1 Q6W5P4 2/20 0.42
HSP90AA1 P07900 1/20 0.36
ESR1 P03372 1/20 0.36
KMT2A Q03164 3/20 0.36
HTT P42858 2/20 0.36
MEN1 O00255 2/20 0.36
NPC1 O15118 1/20 0.35
POLB P06746 1/20 0.35
RAB9A P51151 1/20 0.35
GLA P06280 1/20 0.35
TSHR P16473 1/20 0.35
MAPT P10636 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
ATM Q13315 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
PKM P14618 1/20 0.34
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cupferron SCHEMBL29353485 1.00 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL37151 0.97 ALDH1A1 (0.56) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL451471 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL7513315 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL52291 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL7506189 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL1719170 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL21670430 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL21670426 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1
Cupferron SCHEMBL471987 0.95 ALDH1A1 (0.54) ALDH1A1ALOX15NPSR1HSP90AA1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4797 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12630656-B2 Infrared cut-off filter, solid-state image sensor filter, solid-state image sensor, and method for producing solid-state image sensor filter TOPPAN INC. (JP) 2026-05-19 US claimed
US-12603202-B2 Method for manufacturing sintered magnet and sintered magnet NINGBO KONIT INDUSTRIES INC. (CN) 2026-04-14 US claimed
EP-4092055-B1 INFRARED BLOCKING FILTER, FILTER FOR SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING ELEMENT, AND METHOD FOR PRODUCING FILTER FOR SOLID-STATE IMAGING ELEMENT TOPPAN INC (JP) 2026-01-14 EP claimed
US-20250237947-A1 Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) 2025-07-24 US claimed
CN-120137502-A High-adhesion UV gloss oil for plastic substrate and preparation method thereof 惠州德斯坤化工有限公司 2025-06-13 CN claimed
CN-120025772-A Flexible UV-cured high-temperature-resistant adhesive as well as preparation method and application thereof 苏州吉格邦新材料科技有限公司 2025-05-23 CN claimed
WO-2025082544-A1 GLUE COMPOSITION FOR QUANTUM DOTS 益丰新材料股份有限公司 2025-04-24 WO claimed
CN-119708908-A UV ink duct matt oil and preparation method thereof 惠州市立美特环保油墨有限公司 2025-03-28 CN claimed
CN-119684837-A Preparation method of photo-curing flexographic printing ink for outdoor reflective film 浙江龙游道明光学有限公司 2025-03-25 CN claimed
CN-119528155-A Modified silica sol and preparation method and application thereof 阳江市惠尔特新材料科技有限公司 2025-02-28 CN claimed
US-7067691-B2 reacting an alpha-substituted acrylic acid anhydride with a 1,1-bis(trifluoromethyl)-1,3-diol to produce a 1-optionally substituted 4,4-bis(trifluoromethyl)-3-hydroxy-2-butyl ester of an optionally 2-substituted acrylic acid CENTRAL GLASS CO., LTD. (JP) 2006-06-27 US claimed
US-20040210082-A1 Production method of adamantyl acrylate compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-10-21 US claimed
EP-1468981-A1 Production method of adamantyl acrylate compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-10-20 EP claimed
EP-0656030-B1 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS LOCTITE CORP (US) 2000-07-12 EP claimed
US-5876805-A CONTAINING FREE RADICAL POLYMERIZABLE UNSATURATED COMPOUNDS MINNESOTA MINING & MANUFACTURING CO. (US) 1999-03-02 US claimed
EP-0656030-A4 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS. LOCTITE CORP (US) 1995-12-13 EP claimed
US-5459173-A Heat resistant stabilizers LOCTITE CORPORATION (US) 1995-10-17 US claimed
EP-0656030-A1 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS LOCTITE CORPORATION (US) 1995-06-07 EP claimed
WO-1995000579-A1 STABILIZER SYSTEM FOR THIOL-ENE AND THIOL-NENE COMPOSITIONS LOCTITE CORPORATION (US) 1995-01-05 WO claimed
US-4275142-A CONJUGATED DIOLEFIN-ACRYLIC ACID OR ANHYDRIDE COPOLYMER, PHOTOSENSITIZER JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-06-23 US claimed