Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 5/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.70 |
| ▸ | NPC1 | O15118 | 4/20 | 0.70 |
| ▸ | RAB9A | P51151 | 4/20 | 0.70 |
| ▸ | RAD52 | P43351 | 3/20 | 0.70 |
| ▸ | PKM | P14618 | 3/20 | 0.70 |
| ▸ | HTT | P42858 | 3/20 | 0.70 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.70 |
| ▸ | POLB | P06746 | 3/20 | 0.70 |
| ▸ | MAPT | P10636 | 3/20 | 0.70 |
| ▸ | NSD2 | O96028 | 2/20 | 0.70 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.70 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.70 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.70 |
| ▸ | LMNA | P02545 | 2/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.70 |
| ▸ | THRB | P10828 | 1/20 | 0.70 |
| ▸ | PPARG | P37231 | 1/20 | 0.70 |
| ▸ | RECQL | P46063 | 1/20 | 0.70 |
| ▸ | NCOA2 | Q15596 | 1/20 | 0.70 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9455038 | 1.00 | MEN1 (0.70) | MEN1KMT2ANPC1RAB9ARAD52 | |
| SCHEMBL29053033 | 0.88 | MEN1 (0.73) | MEN1KMT2ANPC1RAB9ARAD52 | |
| SCHEMBL9454769 | 0.87 | KDM4E (0.55) | MEN1KMT2ANPC1RAB9ARAD52 | |
| Iodide SCHEMBL6560159 | 0.85 | KMT2A (0.73) | MEN1KMT2ANPC1RAB9ARAD52 | |
| Iodide SCHEMBL6858988 | 0.85 | KMT2A (0.73) | MEN1KMT2ANPC1RAB9ARAD52 | |
| SCHEMBL13428296 | 0.84 | MEN1 (0.97) | MEN1KMT2ANPC1RAB9ARAD52 | |
| SCHEMBL10036010 | 0.84 | MEN1 (0.97) | MEN1KMT2ANPC1RAB9ARAD52 | |
| SCHEMBL16178080 | 0.84 | RAD52 (0.67) | MEN1KMT2ANPC1RAB9ARAD52 | |
| SCHEMBL16178079 | 0.84 | RAD52 (0.67) | MEN1KMT2ANPC1RAB9ARAD52 | |
| Iodide SCHEMBL11803644 | 0.83 | MEN1 (1.00) | MEN1KMT2ANPC1RAB9ARAD52 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4229482-B1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | SHOWA CHEM (JP) | 2024-09-11 | — | — | EP | disclosed |
| US-11860539-B2 | Polyvinyl acetate based photopolymer | SHOWA KAKO CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230288803-A1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | SHOWA KAKO CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| EP-4229482-A1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | Showa Kako Corporation (JP) | 2023-08-23 | — | — | EP | disclosed |
| WO-2022081652-A1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | SHOWA KAKO CORPORATION (JP) | 2022-04-21 | — | — | WO | disclosed |
| US-5246815-A | Multilayer light sensitive element with polymer films | GEN. DIRECTOR OF THE AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) | 1993-09-21 | — | — | US | disclosed |
| US-5206113-A | Photocurable | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-04-27 | — | — | US | disclosed |
| EP-0252151-B1 | PHOTOSENSITIVE MATERIAL FOR SCREEN PROCESS | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1993-04-14 | — | — | EP | disclosed |
| EP-0252150-B1 | PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PROCESS | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0252152-B1 | PHOTOSENSITIVE EMULSION FOR COATING PLASTIC FILM | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1992-05-13 | — | — | EP | disclosed |
| US-4920030-A | Containing photocrosslinkable polyvinyl alcohol | GENERAL DIRECTOR OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1990-04-24 | — | — | US | disclosed |
| EP-0252150-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PROCESS | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1988-01-13 | — | — | EP | disclosed |
| EP-0252152-A1 | PHOTOSENSITIVE EMULSION FOR COATING PLASTIC FILM | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1988-01-13 | — | — | EP | disclosed |
| EP-0252151-A1 | PHOTOSENSITIVE MATERIAL FOR SCREEN PROCESS | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1988-01-13 | — | — | EP | disclosed |