Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14345836 | 0.78 | CES2 (0.39) | ALOX15TDP1TSHRALDH1A1 | |
| SCHEMBL30465978 | 0.77 | — | — | |
| SCHEMBL13480750 | 0.73 | MEN1 (0.36) | TDP1ALDH1A1 | |
| SCHEMBL17175228 | 0.72 | — | — | |
| SCHEMBL17175235 | 0.72 | CYP19A1 (0.31) | — | |
| SCHEMBL17175239 | 0.70 | TDP1 (0.42) | ALOX15TDP1TSHRALDH1A1 | |
| SCHEMBL14436603 | 0.70 | MAPT (0.38) | TDP1ALDH1A1 | |
| SCHEMBL14279203 | 0.67 | PRKCD (0.30) | TSHR | |
| SCHEMBL18610550 | 0.65 | PTPN1 (0.35) | — | |
| SCHEMBL17147756 | 0.64 | DUSP3 (0.47) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104797350-A | Method for forming multilayer coating film | KANSAI PAINT CO LTD | 2015-07-22 | — | — | CN | disclosed |
| CN-104204116-A | Aqueous paint composition and method of manufacturing painted article | KANSAI PAINT CO LTD | 2014-12-10 | — | — | CN | disclosed |
| CN-104144624-A | High-grade multi-element disposable consumable product | RIBI HANS O | 2014-11-12 | — | — | CN | disclosed |
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| CN-1086195-C | Benzpyrrole substituted flugide photochromic material and its synthetic process and use | INST PHOTOSENSITIVE CHEMISTRY CAS | 2002-06-12 | — | — | CN | disclosed |
| CN-1213686-A | Benzpyrrole substituted flugide photochromic material and its synthetic process and use | INST PHOTOSENSITIVE CHEMISTRY CAS (CN) | 1999-04-14 | — | — | CN | disclosed |
| US-5221318-A | Crop plant selectivity | BAYER AKTIENGESELLSCHAFT (DE) | 1993-06-22 | — | — | US | disclosed |
| US-5069711-A | PREEMERGENCE | BAYER AKTIENGESELLSCHAFT (DE) | 1991-12-03 | — | — | US | disclosed |