⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5411297 | 0.80 | — | — | |
| SCHEMBL8400090 | 0.80 | — | — | |
| SCHEMBL22779222 | 0.80 | — | — | |
| SCHEMBL1784616 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL10449337 | 0.70 | — | — | |
| Water SCHEMBL10861005 | 0.70 | — | — | |
| SCHEMBL3628799 | 0.68 | — | — | |
| SCHEMBL18354141 | 0.68 | ALDH1A1 (0.30) | — | |
| SCHEMBL2268567 | 0.68 | — | — | |
| SCHEMBL13057163 | 0.68 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0320114-B1 | FAUJASITE-TYPE ZEOLITE AND PROCESS FOR MAKING IT | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1993-03-31 | — | — | EP | claimed |
| WO-2024171892-A1 | POLISHING COMPOSITION | 株式会社フジミインコーポレーテッド | 2024-08-22 | — | — | WO | disclosed |
| EP-3864121-B1 | LAUNDRY DETERGENT COMPOSITION COMPRISING A CATECHOL METAL COMPLEX COMPOUND | HENKEL AG & CO KGAA (DE) | 2023-11-29 | — | — | EP | disclosed |
| CN-107075347-B | Polishing composition | 福吉米株式会社 | 2020-03-20 | — | — | CN | disclosed |
| US-10190024-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2019-01-29 | — | — | US | disclosed |
| EP-3211053-B1 | POLISHING COMPOSITION | FUJIMI INC (JP) | 2018-12-19 | — | — | EP | disclosed |
| US-20170247574-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2017-08-31 | — | — | US | disclosed |
| EP-3211053-A1 | COMPOSITION FOR POLISHING | Fujimi Incorporated (JP) | 2017-08-30 | — | — | EP | disclosed |
| CN-107075347-A | Polishing composition | 福吉米株式会社 | 2017-08-18 | — | — | CN | disclosed |