⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4531861 | 0.76 | — | — | |
| SCHEMBL2126231 | 0.76 | — | — | |
| SCHEMBL1130680 | 0.73 | — | — | |
| SCHEMBL20696587 | 0.71 | — | — | |
| SCHEMBL7460597 | 0.69 | ANPEP (0.33) | — | |
| SCHEMBL6274708 | 0.69 | — | — | |
| SCHEMBL5835096 | 0.69 | ALDH1A1 (0.44) | — | |
| SCHEMBL19275065 | 0.69 | — | — | |
| SCHEMBL1130151 | 0.69 | — | — | |
| SCHEMBL20615513 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102924638-B | Preparation method of double-end sulfhydryl polymer | PETROCHINA CO LTD | 2014-04-02 | — | — | CN | claimed |
| CN-102924638-A | Preparation method of double-end sulfhydryl polymer | PETROCHINA CO LTD | 2013-02-13 | — | — | CN | claimed |
| CN-101671369-B | Phosphoryl methyl salinomycin ether derivative and preparation method thereof | QI YOUMAO | 2013-01-30 | — | — | CN | claimed |
| CN-119950826-A | Preparation method of anticoagulation coating and medical instrument | 通桥医疗科技(苏州)有限公司 | 2025-05-09 | — | — | CN | disclosed |
| US-20180258038-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| US-10000450-B2 | N,N-substituted 3-aminopyrrolidine compounds useful as monoamines reuptake inhibitors | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2018-06-19 | — | — | US | disclosed |
| US-20170166524-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-9611214-B2 | N,N-substituted 3-aminopyrrolidine compounds useful as monoamines reuptake inhibitors | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2017-04-04 | — | — | US | disclosed |
| US-20140288065-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8815871-B2 | N,N-substituted 3-aminopyrrolidine compounds useful as monoamines reuptake inhibitors | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| CN-102924638-B | Preparation method of double-end sulfhydryl polymer | PETROCHINA CO LTD | 2014-04-02 | — | — | CN | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6828078-B2 | Photoresist for use in optoelectronic and display fields; porosity; optical fibers | JSR CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |