SCHEMBL9503141

SCHEMBL9503141

NCCCC(O)CCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17695267 0.94 NFKB1 (0.40)
SCHEMBL17695271 0.91 GSR (0.42)
SCHEMBL2399551 0.90 NFKB1 (0.38)
SCHEMBL27691363 0.90 NFKB1 (0.38)
SCHEMBL7194360 0.90 NFKB1 (0.38)
SCHEMBL3686332 0.90 GSR (0.40)
SCHEMBL2026362 0.90 NFKB1 (0.38)
SCHEMBL7196194 0.90 GSR (0.40)
SCHEMBL20639330 0.88 GSR (0.41)
SCHEMBL20639238 0.88 CYP3A4 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3144371-B1 HYDROXYALKYL SUBSTITUTED SUCCINIMIDES AND FUELS CONTAINING THEM AFTON CHEMICAL CORP (US) 2021-10-06 EP claimed
EP-3144371-A1 HYDROXYALKYL SUBSTITUTED SUCCINIMIDES AND FUELS CONTAINING THEM Afton Chemical Corporation (US) 2017-03-22 EP claimed
US-9321976-B1 Hydroxyalkyl substituted succinimides and fuels containing them AFTON CHEMICAL CORPORATION (US) 2016-04-26 US claimed
EP-3337794-B1 HYDROPHILIC COMPOUNDS FOR OPTICALLY ACTIVE DEVICES MERCK PATENT GMBH (DE) 2021-07-21 EP disclosed
CN-105452398-B Composition for ink, ink jet recording method and tingle body using this composition for ink 日本化药株式会社 2018-07-10 CN disclosed
WO-2017032444-A1 HYDROPHILIC COMPOUNDS FOR OPTICALLY ACTIVE DEVICES MERCK PATENT GMBH (DE) 2017-03-02 WO disclosed
EP-3133066-A1 HYDROPHILIC COMPOUNDS FOR OPTICALLY ACTIVE DEVICES Merck Patent GmbH (DE) 2017-02-22 EP disclosed
EP-0300326-B1 HYDROXYPOLYIMIDES AND HIGH TEMPERATURE RESISTANT POSITIVE PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1993-06-16 EP disclosed
US-4927736-A Hydroxy polyimides and high temperature positive photoresists therefrom HOECHST CELANESE CORPORATION (US) 1990-05-22 US disclosed
EP-0300326-A1 Hydroxypolyimides and high temperature resistant positive photoresists HOECHST CELANESE CORPORATION (US) 1989-01-25 EP disclosed
US-4271288-A TETRACARBOXYLIC ACID BONDED TO ARYLENE MOIETY VIA METHYLENE GROUPS THE DOW CHEMICAL COMPANY (US) 1981-06-02 US disclosed