⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4623596 | 0.47 | — | — | |
| SCHEMBL8860314 | 0.35 | — | — | |
| SCHEMBL285122 | 0.35 | — | — | |
| SCHEMBL31430953 | 0.35 | — | — | |
| Ammonia Solution, Strong SCHEMBL5184525 | 0.35 | — | — | |
| Hydroxyl Radical SCHEMBL8597240 | 0.35 | — | — | |
| Hydrogen Sulfide SCHEMBL196034 | 0.35 | — | — | |
| SCHEMBL1056692 | 0.35 | — | — | |
| SCHEMBL1498255 | 0.35 | — | — | |
| SCHEMBL29375564 | 0.35 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110872700-B | Method for preparing silicon-containing films with high carbon content | 弗萨姆材料美国有限责任公司 | 2022-11-08 | — | — | CN | claimed |
| US-12601048-B2 | Film forming method and film forming apparatus | TOKYO ELECTRON LIMITED (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20230399737-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2023-12-14 | — | — | US | disclosed |
| CN-110872700-B | Method for preparing silicon-containing films with high carbon content | 弗萨姆材料美国有限责任公司 | 2022-11-08 | — | — | CN | disclosed |
| WO-2022085499-A1 | FILM FORMING METHOD AND FILM FORMING APPARATUS | 東京エレクトロン株式会社 | 2022-04-28 | — | — | WO | disclosed |
| US-20180033614-A1 | Compositions and Methods Using Same for Carbon Doped Silicon Containing Films | VERSUM MATERIALS US, LLC (US) | 2018-02-01 | — | — | US | disclosed |
| EP-0295061-B1 | POLYDISILACYCLOBUTASILAZANES | DOW CORNING CORPORATION (US) | 1993-07-21 | — | — | EP | disclosed |
| EP-0295061-A2 | Polydisilacyclobutasilazanes | DOW CORNING CORPORATION (US) | 1988-12-14 | — | — | EP | disclosed |
| US-4774312-A | Polydisilacyclobutasilazanes | DOW CORNING CORPORATION (US) | 1988-09-27 | — | — | US | disclosed |