SCHEMBL9507192

SCHEMBL9507192

O=C(O)C(F)(Cl)C(Cl)(Cl)Cl

nearest known ligand 0.47

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.47
TSHR P16473 2/20 0.47
TP53 P04637 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.35
THRB P10828 1/20 0.33
CYP1A2 P05177 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5611012 0.86 ALDH1A1 (0.53) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL4853439 0.80 ALDH1A1 (0.47) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL9619921 0.80 ALDH1A1 (0.47) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL9619625 0.80 ALDH1A1 (0.47) ALDH1A1TSHRTP53L3MBTL1THRB
Hydrochloric Acid SCHEMBL23706484 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL4850859 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL8303923 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL4853887 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTP53L3MBTL1THRB
SCHEMBL9619742 0.75 ALDH1A1 (0.42) ALDH1A1TSHRTP53L3MBTL1THRB
Ammonia Solution, Strong SCHEMBL9718365 0.75 ALDH1A1 (0.36) ALDH1A1TSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5114546-A Dehalogenation to form unsaturated compounds HOECHST AKTIENGESELLSCHAFT (DE) 1992-05-19 US claimed
EP-0308838-B1 PROCESS FOR THE PRODUCTION OF FLUORINATED ACRYLIC ACIDS AND THEIR DERIVATIVES HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-29 EP claimed
EP-0308838-A1 Process for the production of fluorinated acrylic acids and their derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1989-03-29 EP claimed
WO-2024248021-A1 FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION セントラル硝子株式会社 2024-12-05 WO disclosed
EP-0548141-A1 PROCESS FOR PRODUCING HALOGENATED ACRYLIC ACIDS HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-30 EP disclosed
US-5114546-A Dehalogenation to form unsaturated compounds HOECHST AKTIENGESELLSCHAFT (DE) 1992-05-19 US disclosed
WO-1992005299-A1 PROCESS FOR PRODUCING HALOGENATED ACRYLIC ACIDS HOECHST AKTIENGESELLSCHAFT (DE) 1992-04-02 WO disclosed
EP-0308838-B1 PROCESS FOR THE PRODUCTION OF FLUORINATED ACRYLIC ACIDS AND THEIR DERIVATIVES HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-29 EP disclosed
EP-0308838-A1 Process for the production of fluorinated acrylic acids and their derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1989-03-29 EP disclosed