Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.66 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 6/20 | 0.49 |
| ▸ | ACHE | P22303 | 5/20 | 0.46 |
| ▸ | BCHE | P06276 | 2/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | PHLPP2 | Q6ZVD8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | BACE1 | P56817 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9507521 | 0.85 | MAPT (0.61) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL31361989 | 0.82 | MAPT (0.72) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL11886403 | 0.79 | MAPT (1.00) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL11832913 | 0.78 | MAPT (0.66) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL29559175 | 0.78 | MAPT (0.61) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL29559816 | 0.78 | MAPT (0.66) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL7526150 | 0.78 | MAPT (0.66) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL3878871 | 0.78 | MAPT (0.61) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL719267 | 0.78 | MAPT (0.66) | MAPTNPSR1PTGS2ACHEBCHE | |
| SCHEMBL30443281 | 0.78 | MAPT (0.66) | MAPTNPSR1PTGS2ACHEBCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103784458-B | Phenylalamine derivatives | AJINOMOTO K. K. (JP) | 2015-10-14 | — | — | CN | disclosed |
| CN-1917881-B | Novel phenylalanine derivatives | AJINOMOTO KK | 2014-11-26 | — | — | CN | disclosed |
| CN-103784458-A | Novel phenylalanine derivatives | AJINOMOTO KK | 2014-05-14 | — | — | CN | disclosed |
| EP-0337258-B1 | LIGHT SENSITIVE COMPOSITIONS FOR LIGHT SENSITIVE COATING MATERIALS AND PROCESSES FOR OBTAINING RELIEF PATTERNS AND IMAGES | BASF Aktiengesellschaft (DE) | 1993-06-23 | — | — | EP | disclosed |
| EP-0277555-B1 | COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES | BASF Aktiengesellschaft (DE) | 1992-04-08 | — | — | EP | disclosed |
| EP-0271010-B1 | COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND THEIR USE | BASF Aktiengesellschaft (DE) | 1991-12-11 | — | — | EP | disclosed |
| US-5064746-A | RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1991-11-12 | — | — | US | disclosed |
| EP-0337258-A2 | Light sensitive compositions for light sensitive coating materials and processes for obtaining relief patterns and images | BASF Aktiengesellschaft (DE) | 1989-10-18 | — | — | EP | disclosed |
| US-4822866-A | PLASMA RESISTANT PHOTORESISTS; REMOVABLE WITH WEAK ALKALINE SOLUTIONS | BASF AKTIENGESELLSCHAFT (DE) | 1989-04-18 | — | — | US | disclosed |
| US-4812542-A | PHOTORESISTS, LIGHT-SENSITIVE COATINGS | BASF AKTIENGESELLSCHAFT (DE) | 1989-03-14 | — | — | US | disclosed |
| EP-0277555-A2 | Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices | BASF Aktiengesellschaft (DE) | 1988-08-10 | — | — | EP | disclosed |
| EP-0276709-A2 | Copolymers with O-nitrocarbionol ester groups, their use and process for preparing semiconductor elements | BASF Aktiengesellschaft (DE) | 1988-08-03 | — | — | EP | disclosed |
| EP-0271010-A2 | Copolymers with 0-nitrocarbinol ester groups, and their use | BASF Aktiengesellschaft (DE) | 1988-06-15 | — | — | EP | disclosed |