SCHEMBL9508224

SCHEMBL9508224

CCCCCCCCCCCCCCCCOCC(O)CN(CCCO)C(=O)CCCCCCCCCCCCCCC

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.51
LPAR5 Q9H1C0 1/20 0.48
HTT P42858 2/20 0.47
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45
CYP2C19 P33261 1/20 0.45
PLA2G2C Q5R387 3/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
SPHK1 Q9NYA1 1/20 0.40
KDM4E B2RXH2 1/20 0.40
DUSP3 P51452 1/20 0.40
LMNA P02545 1/20 0.40
P2RY10 O00398 1/20 0.38
THRB P10828 1/20 0.38
MAPT P10636 1/20 0.38
LPAR1 Q92633 2/20 0.38
LPAR3 Q9UBY5 2/20 0.38
FFAR4 Q5NUL3 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9509718 0.96 USP2 (0.50) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL9352332 0.94 USP2 (0.50) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL5604280 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL8536163 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL2423400 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL5178380 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL2497008 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL9417254 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL5180047 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4
SCHEMBL5180698 0.93 USP2 (0.53) USP2LPAR5HTTCYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0282816-B1 EXTERNAL SKIN CARE PREPARATION Kao Corporation (JP) 1993-09-15 EP disclosed
US-5071971-A Using glycolipid derivative to cure skin roughness KAO CORPORATION (JP) 1991-12-10 US disclosed
US-5028416-A Moisturizers, cosmetics, amide or amine containing hydroxy groups and alkyl ether groups KAO CORPORATION (JP) 1991-07-02 US disclosed
US-4985547-A Containing an Amide Derivative KAO CORPORATION (JP) 1991-01-15 US disclosed
EP-0282816-A2 External skin care preparation Kao Corporation (JP) 1988-09-21 EP disclosed