SCHEMBL9510154

SCHEMBL9510154

BrCCc1ccc(-c2ccc(CCBr)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.60
HRH3 Q9Y5N1 7/20 0.46
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
MAOB P27338 5/20 0.41
FFAR1 O14842 1/20 0.39
GFER P55789 1/20 0.36
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
TAAR1 Q96RJ0 2/20 0.36
HTR2A P28223 1/20 0.36
KCNH2 Q12809 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9553181 1.00 TDP1 (0.60) TDP1HRH3MEN1KMT2AMAOB
Water SCHEMBL11482042 0.97 TDP1 (0.57) TDP1HRH3MEN1KMT2AMAOB
SCHEMBL2281085 0.90 TDP1 (0.71) TDP1MEN1KMT2AMAOBGFER
SCHEMBL2161829 0.89 TDP1 (0.71) TDP1FFAR1TAAR1KCNH2
SCHEMBL19676926 0.87 CYP1A2 (0.50) TDP1HRH3MEN1KMT2ATAAR1
SCHEMBL10655296 0.87 TDP1 (0.48) TDP1HRH3MEN1KMT2AGFER
SCHEMBL7465853 0.87 MAOB (0.59) TDP1MAOBTAAR1
SCHEMBL7459305 0.87 MAOB (0.59) TDP1MAOBTAAR1
SCHEMBL30932186 0.87 TDP1 (0.67) TDP1MEN1KMT2AMAOBFFAR1
SCHEMBL2181329 0.82 HRH3 (0.42) TDP1HRH3MEN1KMT2AMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116253887-B POSS-based organic porous polymer for catalyzing cycloaddition reaction of epoxide and carbon dioxide 福州大学 2024-05-03 CN disclosed
CN-116253887-A POSS-based organic porous polymer for catalyzing cycloaddition reaction of epoxide and carbon dioxide 福州大学 2023-06-13 CN disclosed
EP-0311387-B1 AROMATIC AMINE RESINS, THEIR PRODUCTION PROCESS AND THERMOSETTING RESIN COMPOSITIONS MAKING USE OF THE SAME MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-08-11 EP disclosed