SCHEMBL9511963

SCHEMBL9511963

CCCCCCCCCCCCCCCCCC(=O)N(CCO)CC(O)CCCCCCCCCCCCCC

nearest known ligand 0.51

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 2/20 0.51
FFAR1 O14842 2/20 0.51
GPR84 Q9NQS5 5/20 0.45
FAAH O00519 2/20 0.43
PSMD14 O00487 2/20 0.43
PLA2G1B P04054 2/20 0.43
MMP2 P08253 2/20 0.43
ATG4B Q9Y4P1 2/20 0.43
HSP90AA1 P07900 1/20 0.43
RAD52 P43351 1/20 0.43
NFKB1 P19838 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8080766 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL8081194 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL8053818 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL2637960 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL2638062 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL18038938 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL25139921 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL2638825 1.00 FFAR4 (0.51) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL7584644 0.95 FFAR1 (0.46) FFAR4FFAR1GPR84FAAHPSMD14
SCHEMBL2639555 0.95 FFAR1 (0.46) FFAR4FFAR1GPR84FAAHPSMD14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-63227514-A None JP disclosed
EP-0282816-B1 EXTERNAL SKIN CARE PREPARATION Kao Corporation (JP) 1993-09-15 EP disclosed
US-5071971-A Using glycolipid derivative to cure skin roughness KAO CORPORATION (JP) 1991-12-10 US disclosed
US-5028416-A Moisturizers, cosmetics, amide or amine containing hydroxy groups and alkyl ether groups KAO CORPORATION (JP) 1991-07-02 US disclosed
US-4985547-A Containing an Amide Derivative KAO CORPORATION (JP) 1991-01-15 US disclosed
EP-0282816-A2 External skin care preparation Kao Corporation (JP) 1988-09-21 EP disclosed
JP-S63227514-A DERMATIC DRUG FOR EXTERNAL APPLICATION KAO CORP 1988-09-21 JP disclosed