SCHEMBL9514972

SCHEMBL9514972

COc1cc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)ccc1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 10/20 0.59
TTR P02766 1/20 0.56
NFE2L2 Q16236 2/20 0.55
TYR P14679 1/20 0.54
ALOX5 P09917 3/20 0.54
NFKB1 P19838 2/20 0.50
STAT3 P40763 2/20 0.50
NFKB2 Q00653 2/20 0.50
RELA Q04206 2/20 0.50
MMP9 P14780 2/20 0.50
PTGS2 P35354 2/20 0.50
PRKCE Q02156 2/20 0.50
PRKCQ Q04759 2/20 0.50
PRKCD Q05655 2/20 0.50
CAMK2A Q9UQM7 2/20 0.50
CXCL12 P48061 1/20 0.50
MAPT P10636 1/20 0.50
ALOX12 P18054 1/20 0.50
KDR P35968 1/20 0.50
XDH P47989 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29904497 0.89 TUBB1 (0.57) APPALOX5MAPTCYP1A2MEN1
SCHEMBL151091 0.87 MAPT (0.53) APPTTRNFE2L2PTGS2MAPT
SCHEMBL21940413 0.87 MAPT (0.53) APPTTRNFE2L2PTGS2MAPT
SCHEMBL29417481 0.87 MAPT (0.53) APPTTRNFE2L2PTGS2MAPT
SCHEMBL151090 0.87 MAPT (0.53) APPTTRNFE2L2PTGS2MAPT
SCHEMBL29363338 0.87 MAPT (0.53) APPTTRNFE2L2PTGS2MAPT
SCHEMBL1507965 0.82 TUBB1 (0.42) APPNFE2L2PTGS2MAPTCYP1A2
SCHEMBL14407712 0.82 TUBB1 (0.42) APPNFE2L2PTGS2MAPTCYP1A2
SCHEMBL19750562 0.82 ALDH1A1 (0.43) APPNFE2L2MAPTCYP1A2MEN1
SCHEMBL147173 0.81 CYP1A1 (0.51) MAPTCYP1A2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0303945-B1 Photosensitive composition based on 1,2-naphthoquinone diazides, and copying material prepared therefrom HOECHST AG (DE) 1993-11-24 EP disclosed
EP-0234570-B1 PHOTOPOLYMERIZABLE COMPOSITION, PHOTOSENSITIVE ELEMENT WITH THAT COMPOSITION, AND PROCESS FOR THE PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE USING THIS ELEMENT BASF Aktiengesellschaft (DE) 1992-04-22 EP disclosed
US-4935330-A Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element BASF AKTIENGESELLSCHAFT (DE) 1990-06-19 US disclosed
EP-0303945-A2 Photosensitive composition based on 1,2-naphthoquinone diazides, and copying material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1989-02-22 EP disclosed
US-4758497-A Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds POLYCHROME CORPORATION (US) 1988-07-19 US disclosed