SCHEMBL9517249

SCHEMBL9517249

CCC(C=C(C)C(N)=O)S(=O)(=O)O.OCCC(CO)C(CO)CP

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL553869 0.81 KDM4E (0.30)
SCHEMBL9641193 0.71
SCHEMBL305051 0.66 APEX1 (0.30)
SCHEMBL2277084 0.66 APEX1 (0.30)
SCHEMBL27566062 0.65
Potassium Ion SCHEMBL1023573 0.65 CYP3A4 (0.30)
Potassium Ion SCHEMBL6063598 0.65 CYP3A4 (0.30)
SCHEMBL4669521 0.65 KDM4E (0.30)
SCHEMBL9345636 0.64 CYP3A4 (0.32)
SCHEMBL1427052 0.61 KDM4E (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0473824-B1 Synthetic resin molded article having good antistatic property and process for preparation thereof MITSUBISHI RAYON CO (JP) 1993-12-29 EP disclosed
US-5175059-A Anionic polymers MITSUBISHI RAYON COMPANY LTD. (JP) 1992-12-29 US disclosed
US-5143675-A Anionic surfactants MISTUBISHI RAYON CO., LTD. (JP) 1992-09-01 US disclosed
EP-0473824-A1 Synthetic resin molded article having good antistatic property and process for preparation thereof MITSUBISHI RAYON CO., LTD. (JP) 1992-03-11 EP disclosed