SCHEMBL95236

SCHEMBL95236

CCn1nnnc1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2088828 0.80
SCHEMBL2088514 0.75 P2RX7 (0.46)
SCHEMBL2163916 0.74
SCHEMBL11110518 0.73
SCHEMBL4410876 0.73 MAPK1 (0.43)
SCHEMBL15186990 0.73
SCHEMBL4631233 0.72
SCHEMBL4405726 0.72
SCHEMBL8131048 0.72
SCHEMBL6358213 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114032548-A Copper foil etching solution for printed circuit board 河南慧泽生物工程有限公司 2022-02-11 CN claimed
CN-113079628-A Processing method of resistance copper foil material for mobile phone vibration motor PCB 东莞市科佳电路有限公司 2021-07-06 CN claimed
CN-104651840-B Etching composition and the manufacture method for having used its printed circuit board (PCB) 三菱瓦斯化学株式会社 2018-05-01 CN claimed
CN-104120427-B The processing method of wiring substrate and the wiring substrate manufactured using this method 三菱瓦斯化学株式会社 2017-11-28 CN claimed
US-9691951-B2 Curable silicone composition, and optical semiconductor device DOW CORNING TORAY CO., LTD. (JP) 2017-06-27 US claimed
EP-3059768-A1 CURABLE SILICONE COMPOSITION, AND OPTICAL SEMICONDUCTOR DEVICE Dow Corning Toray Co., Ltd. (JP) 2016-08-24 EP claimed
US-20160233395-A1 Curable Silicone Composition, And Optical Semiconductor Device DOW TORAY CO., LTD. (JP) 2016-08-11 US claimed
US-9394616-B2 Etching composition and method for producing printed-wiring board using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-07-19 US claimed
US-9301399-B2 Method of treating wiring substrate and wiring substrate manufactured by the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-03-29 US claimed
US-20150144591-A1 ETCHING COMPOSITION AND METHOD FOR PRODUCING PRINTED-WIRING BOARD USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-05-28 US claimed
CN-104651840-A Etching composition and method for producing printed-wiring board using the same MITSUBISHI GAS CHEMICAL CO 2015-05-27 CN claimed
CN-104120427-A Method of treating wiring substrate and wiring substrate manufactured by same MITSUBISHI GAS CHEMICAL CO 2014-10-29 CN claimed
US-20140311778-A1 METHOD OF TREATING WIRING SUBSTRATE AND WIRING SUBSTRATE MANUFACTURED BY THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-10-23 US claimed
US-12630931-B2 Roughening solution for rolled copper foil and method for producing roughened copper foil MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-05-19 US disclosed
US-20250011940-A1 ROUGHENING SOLUTION FOR ROLLED COPPER FOIL AND METHOD FOR PRODUCING ROUGHENED COPPER FOIL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-01-09 US disclosed
CN-118251516-A Roughening solution for rolled copper foil and method for producing roughened copper foil 三菱瓦斯化学株式会社 2024-06-25 CN disclosed
EP-0572178-B1 Resin compositions for laser marking GE PLASTICS JAPAN LTD (JP) 1997-04-16 EP disclosed
US-5373039-A Thermoplastic resin, tetrazole compound and carbon black GENERAL ELECTRIC COMPANY (US) 1994-12-13 US disclosed
EP-0572178-A1 Resin compositions for laser marking GE PLASTICS JAPAN LIMITED (JP) 1993-12-01 EP disclosed
EP-0566312-A1 Resin compositions for laser marking GE PLASTICS JAPAN LIMITED (JP) 1993-10-20 EP disclosed