⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28383588 | 0.86 | — | — | |
| SCHEMBL18378025 | 0.84 | — | — | |
| SCHEMBL18243378 | 0.82 | — | — | |
| SCHEMBL28384609 | 0.80 | — | — | |
| SCHEMBL28384036 | 0.79 | — | — | |
| SCHEMBL28383052 | 0.78 | — | — | |
| SCHEMBL284946 | 0.77 | TSHR (0.50) | — | |
| SCHEMBL8558513 | 0.74 | — | — | |
| SCHEMBL9201518 | 0.72 | — | — | |
| SCHEMBL20486967 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11370751-B2 | Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof | SAN APRO LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| CN-114502613-A | Curable composition, cured product, and method for forming cured product | 东京应化工业株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-108884110-B | Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof | 三亚普罗股份有限公司 | 2021-09-14 | — | — | CN | disclosed |
| CN-109311915-B | Sulfonium salt, thermal or photoacid generator, thermal or photocurable composition, and cured product thereof | 三亚普罗股份有限公司 | 2021-09-14 | — | — | CN | disclosed |
| US-20210189080-A1 | COMPOSITION FOR FORMING HARD COAT, METHOD FOR PRODUCING ARTICLE HAVING HARD COAT, HARD COAT, HARD-COATED ARTICLE, AND SILANE-MODIFIED ALICYCLIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-24 | — | — | US | disclosed |
| WO-2021065796-A1 | CURABLE COMPOSITION, CURED MATERIAL, AND METHOD FOR FORMING CURED MATERIAL | 東京応化工業株式会社 | 2021-04-08 | — | — | WO | disclosed |
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-20190284134-A1 | SULFONIUM SALT, HEAT- OR PHOTO-ACID GENERATOR, HEAT- OR PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT THEREOF | SAN APRO LTD. (JP) | 2019-09-19 | — | — | US | disclosed |
| US-20160342084-A1 | ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| EP-0320733-B1 | 2-TERT.-BUTYL-5-ISOXAZOLYL METHYLTHIO-3(2H)-PYRIDAZIN-3-ONE DERIVATIVES | BASF Aktiengesellschaft (DE) | 1993-03-03 | — | — | EP | disclosed |
| US-4929617-A | INSECTICIDES, MITICIDES | BASF AKTIENGESELLSCHAFT (DE) | 1990-05-29 | — | — | US | disclosed |
| EP-0351589-A2 | 3(2H)-Pyridazinone derivatives for controlling snails | BASF Aktiengesellschaft (DE) | 1990-01-24 | — | — | EP | disclosed |
| EP-0320733-A2 | 2-tert.-butyl-5-isoxazolyl methylthio-3(2H)-pyridazin-3-one derivatives | BASF Aktiengesellschaft (DE) | 1989-06-21 | — | — | EP | disclosed |