SCHEMBL9533100

SCHEMBL9533100

OCc1nc2c(O)cccc2[nH]1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIN1 Q05586 1/20 0.55
GRIN2B Q13224 1/20 0.55
PDE10A Q9Y233 1/20 0.54
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
COASY Q13057 1/20 0.42
TDP1 Q9NUW8 1/20 0.41
ACHE P22303 1/20 0.41
GAA P10253 3/20 0.41
MGAM O43451 2/20 0.41
SI P14410 2/20 0.41
MGAM2 Q2M2H8 2/20 0.41
RHEB Q15382 2/20 0.40
MAPT P10636 2/20 0.40
TSHR P16473 2/20 0.40
KDM4E B2RXH2 1/20 0.40
LMNA P02545 1/20 0.40
TP53 P04637 1/20 0.40
ALOX12 P18054 1/20 0.40
ATR Q13535 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10072578 0.84 GRIN1 (0.54) GRIN1GRIN2BPDE10AKMT2AMEN1
SCHEMBL4066021 0.84 GRIN1 (0.54) GRIN1GRIN2BPDE10AKMT2AMEN1
SCHEMBL16523722 0.82 GRIN1 (0.52) GRIN1GRIN2BPDE10ACOASYACHE
SCHEMBL10397230 0.81 PDE10A (0.57) GRIN1GRIN2BPDE10ACOASYGAA
SCHEMBL14300571 0.80 TDP1 (0.40) GRIN1GRIN2BPDE10ATDP1RHEB
SCHEMBL5744116 0.80 EGLN1 (0.42) GRIN1GRIN2BTDP1GAAMGAM
SCHEMBL4346855 0.80 MGAM (0.51) TDP1GAAMGAMSIMGAM2
SCHEMBL3938941 0.80 CHEK1 (0.57) GRIN1GRIN2BPDE10AKMT2AMEN1
SCHEMBL10634828 0.80 GRIN2B (0.50) GRIN1GRIN2BPDE10AKMT2AMEN1
SCHEMBL11195004 0.80 GRIN1 (0.53) GRIN1GRIN2BPDE10AKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9323153-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2016-04-26 US disclosed
US-9323153-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2016-04-26 US disclosed
US-20150004533-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
US-20150004533-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
WO-2013147286-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2013-10-03 WO disclosed
EP-0266326-B1 NOVEL DERIVATIVES OF BENZIMIDAZOLES ACTIVE AS ANTI-ULCER AGENTS Aktiebolaget Hässle (SE) 1993-03-10 EP disclosed
US-5106862-A DERIVATIVES OF BENZIMIDAZOLES ACTIVE AS ANTI-ULCER AGENTS AKTIEBOLAGET HASSLE (SE) 1992-04-21 US disclosed